Low temperature (320°C) deposition of hydrogenated microcrystalline cubic silicon carbide thin films

Materials Science Forum

Volumn 457-460, Issue I, 2004, Pages 317-320

  Miyajima, S ^a   Yamada, A ^a   Konagai, M ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

3C SiC; Hot wire CVD; Monomethylsilane; SiC on glass

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGENATION; PARAMAGNETIC RESONANCE; SILICON; SOLAR CELLS; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

3C-SIC; HOT WIRE CVD; MONOMETHYLSILANE; SIC ON GLASS;

SILICON CARBIDE;

EID: 8644278079     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/msf.457-460.317     Document Type: Conference Paper

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