Calibration of Radiation Thermometers in Rapid Thermal Processing Tools Using Si Wafers with Thin-film Thermocouples

AIP Conference Proceedings

Volumn 684, Issue , 2003, Pages 1087-1092

  Kreider, K G ^a   Kimes, W A ^a   Meyer, C W ^a   Ripple, D C ^a   Tsai, B K ^a   Chen, D H ^a   Dewitt, D P ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CALIBRATION; EQUIPMENT TESTING; RAPID THERMAL PROCESSING; SILICON WAFERS; TEMPERATURE MEASUREMENT; THERMOCOUPLES; THERMOMETERS; UNCERTAINTY ANALYSIS;

HIGH TEMPERATURE; RADIANCE TEMPERATURES; RADIATION THERMOMETERS; RADIATIVE PROPERTIES; SI WAFER; THERMOCOUPLE JUNCTIONS; THIN FILM THERMOCOUPLE; WAFER SURFACE;

THIN FILMS;

EID: 85113588021     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.1627274     Document Type: Conference Paper

References (7)

1. Tsai, B. K. and De Witt, D. P., "Characterization and Calibration of Lightpipe Radiation Thermometers for use in Rapid Thermal Processing," in Temperature: Its Measurement and Control in Science and Industry, Vol. 7, edited by D. C. Ripple et al., AIP Conference Proceedings, Melville, New York, 2003.
2. thInt'l Conf. on Advanced Thermal Processing of Semiconductors, edited by D. P. De Witt et al., RTPConference, Gaithersburg, MD, 2000, pp. 64-70.
3. Kreider, K. G., De Witt, D. P., Tsai, B. K., Lovas, F. J., and Allen, D. W. "RTP calibration wafer using thin-film thermocouples," in Rapid Thermal and Integrated Processing VII, edited by M. Ozturk et al., Ed. MRS, Pittsburgh, PA, 1998, pp. 87-94.
4. Kreider, K. G. and Gillen, G. J., Thin Solid Films 376, 32-37 (2000).
5. Tsai, B. K., De Witt, D. P., Lovas, F. J., Kreider, K. G., Meyer, C. W., and Allen. D. W., "Chamber Radiation Effects on Calibration of Radiation Thermometers," in Proceedings of TEMPMEKO '99, edited by J. F. Dubbeldam and M. J. de Groot, NMi Van Swinden Lab., Delft, 1999, pp. 726-731.
6. Burns, G. W. and Ripple, D. C., "Techniques for Fabricating and Annealing Pt/Pd Thermocouples for Accurate Measurements in the Range 0 °C to 1300 °C," in Proceedings of TEMPMEKO '96, edited by P. Marcarino, Levrotto & Bella, Torino, 1997, pp. 171-176.
7. Kreider, K. G. Ripple, D. C., and De Witt, D. P., "Calibration of Thin-film Thermocouples on Silicon Wafers", in Proceedings of TEMPMEKO '99, edited by J. F. Dubbeldam and M. J. de Groot, NMi Van Swinden Lab., Delft, 1999, pp. 286-291.