Design and fabrication of optical microcavities using III-V semiconductor-based MOEMS

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4178, Issue , 2000, Pages 298-309

  Viktorovitch, Pierre ^a   Leclercq, Jean Louis ^a   Goutain, Eric ^b   Rondi, D ^b  

^a INSTITUT DES NANOTECHNOLOGIES DE LYON   (France)

^b THALES   (France)

Author keywords

Fabry perot micro cavity; Inp; Moems; Routing photonic devices; Tunable filter

Indexed keywords

BIT ERROR RATE; FABRICATION; III-V SEMICONDUCTORS; INDIUM PHOSPHIDE; MICROCAVITIES; MULTIPLEXING EQUIPMENT; PHOTONIC DEVICES; SEMICONDUCTING INDIUM PHOSPHIDE; SIGNAL PROCESSING; SURFACE MICROMACHINING;

BASIC BUILDING BLOCK; BIT ERROR RATE MEASUREMENTS; FIBER TRANSMISSIONS; LOW INSERTION LOSS; OPTICAL MICROCAVITIES; OPTICAL TELECOMMUNICATION; POLARIZATION DEPENDENCE; WAVELENGTH-DIVISION MULTIPLEXING SYSTEM;

MOEMS;

EID: 85088371604     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.396501     Document Type: Conference Paper

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