A high-pressure interconnect for chemical microsystem applications

Lab on a Chip

Volumn 1, Issue 2, 2001, Pages 148-152

  Nittis, V ^a   Fortt, R ^a   Legge, C H ^a   De Mello, A J ^a,b  

^a GlaxoSinithKline   (United Kingdom)

^b IMPERIAL COLLEGE LONDON   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 85049416130     PISSN: 14730197     EISSN: None     Source Type: Journal    
DOI: 10.1039/b107836h     Document Type: Article

References (15)

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