Thickness Monitoring of nm Period EUV Multilayer Fabrication by Ellipsometry

AIP Conference Proceedings

Volumn 705, Issue , 2004, Pages 732-735

  Tsuru, Toshihide ^a   Tsutou, Takashi ^a   Hatano, Tadashi ^a   Yamamoto, Masaki ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 85012267460     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.1757900     Document Type: Conference Paper

References (8)

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2. Azzam, R. M. A., Bashara, N. M., Ellipsometry And Polarized Light, Elsevier Science Ltd Press, 1987.
3. Yamamoto, M., Hotta, Y., Sato, M., Thin Solid Films 433, 224-229 (2003).
4. Yamamoto, M., Namioka, T., Appl. Opt. 31, 1622-1630 (1992).
5. Sakano, K., Yamamoto, M, "Development of Soft X-ray Multilayer Mirrors for a Wavelength of 3nm" in EUV, X-Ray, and Neutron Optics and Sources, edited by C. A. MacDonald et al., Proceedings of SPIE 3767, Denver, Colorado, 1999, pp. 238-241
6. Layer, H. P., Surf. Sci. 16, 177-192 (1969).
7. Matieu, H. J., McClure, D. E., Muller, R. H., Rev. Sci. Instrum. 45, 798-802 (1974).
8. Yamamoto, M., Namioka, T., Appl. Opt. 31, 1612-1621 (1992).