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Volumn 112, Issue Part 4, 2008, Pages

Detailed atomic modeling of Sn plasmas for the EUV source

Author keywords

[No Author keywords available]

Indexed keywords

EMISSION SPECTROSCOPY; EXTREME ULTRAVIOLET LITHOGRAPHY; FUSION REACTIONS; INERTIAL CONFINEMENT FUSION; ITERATIVE METHODS; LASER FUSION; LIGHT SOURCES; TIN; ULTRAVIOLET DEVICES;

EID: 84996538030     PISSN: 17426588     EISSN: 17426596     Source Type: Conference Proceeding    
DOI: 10.1088/1742-6596/112/4/042062     Document Type: Conference Paper
Times cited : (7)

References (5)
  • 1
    • 33745608707 scopus 로고    scopus 로고
    • Emerging Lithographic Technologies X
    • Stamm U, et al 2006 Proceedings of SPIE vol.6151 Emerging Lithographic Technologies X, 61510O
    • (2006) Proceedings of SPIE , vol.6151 , pp. 61510O
    • Stamm, U.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.