-
9
-
-
79960648157
-
-
M. Xu Y. Gao E. M. Moreno M. Kunst M. Muhler Y. Wang H. Idriss C. Woll Phys. Rev. Lett. 2011 106 138302
-
(2011)
Phys. Rev. Lett.
, vol.106
, pp. 138302
-
-
Xu, M.1
Gao, Y.2
Moreno, E.M.3
Kunst, M.4
Muhler, M.5
Wang, Y.6
Idriss, H.7
Woll, C.8
-
14
-
-
84910002453
-
-
C. Dette M. A. Perez-Osorio S. Christopher P. Punke E. Christopher P. P. Jacobson F. Giustino S. J. Jung K. Kern Nano Lett. 2014 14 6533 6538
-
(2014)
Nano Lett.
, vol.14
, pp. 6533-6538
-
-
Dette, C.1
Perez-Osorio, M.A.2
Christopher, S.3
Punke, P.4
Christopher, E.5
Jacobson, P.P.6
Giustino, F.7
Jung, S.J.8
Kern, K.9
-
23
-
-
84956573491
-
-
S. S. Reddy K. Gunasekar J. H. Heo S. H. Im C. S. Kim D. H. Kim J. H. Moon J. Y. Lee M. Song S. H. Jin Adv. Mater. 2016 28 686 693
-
(2016)
Adv. Mater.
, vol.28
, pp. 686-693
-
-
Reddy, S.S.1
Gunasekar, K.2
Heo, J.H.3
Im, S.H.4
Kim, C.S.5
Kim, D.H.6
Moon, J.H.7
Lee, J.Y.8
Song, M.9
Jin, S.H.10
-
25
-
-
84951796242
-
-
Z. Ren J. Wang Z. Pan K. Zhao H. Zhang Y. Li Y. Zhao I. M. Sero J. Bisquert X. Zhong Chem. Mater. 2015 27 8398 8405
-
(2015)
Chem. Mater.
, vol.27
, pp. 8398-8405
-
-
Ren, Z.1
Wang, J.2
Pan, Z.3
Zhao, K.4
Zhang, H.5
Li, Y.6
Zhao, Y.7
Sero, I.M.8
Bisquert, J.9
Zhong, X.10
-
28
-
-
84883302319
-
-
J. Fang L. Xu Z. Zhang Y. Yuan S. Cao Z. Wang L. Yin Y. Liao C. Yue ACS Appl. Mater. Interfaces 2013 5 8088 8092
-
(2013)
ACS Appl. Mater. Interfaces
, vol.5
, pp. 8088-8092
-
-
Fang, J.1
Xu, L.2
Zhang, Z.3
Yuan, Y.4
Cao, S.5
Wang, Z.6
Yin, L.7
Liao, Y.8
Yue, C.9
-
38
-
-
84981352026
-
-
H. J. Kim S. M. Suh S. S. Rao D. Punnoose C. V. Tulasivarma C. V. V. M. Gopi N. Kundakarla S. Ravi I. K. Durga J. Electroanal. Chem. 2016 777 123 132
-
(2016)
J. Electroanal. Chem.
, vol.777
, pp. 123-132
-
-
Kim, H.J.1
Suh, S.M.2
Rao, S.S.3
Punnoose, D.4
Tulasivarma, C.V.5
Gopi, C.V.V.M.6
Kundakarla, N.7
Ravi, S.8
Durga, I.K.9
-
41
-
-
0010357276
-
-
Version 3.4 (web version)
-
C. D. Wagner, A. V. Naumkin, A. Kraut-Vass, J. W. Allison, C. J. Powell and J. R. Rumble, Jr, NIST Standard Reference Database 20, Version 3.4 (web version), http://srdata.nist.gov/xps/, 2003
-
(2003)
NIST Standard Reference Database 20
-
-
Wagner, C.D.1
Naumkin, A.V.2
Kraut-Vass, A.3
Allison, J.W.4
Powell, C.J.5
Rumble, J.R.6
-
46
-
-
84948704764
-
-
S. Wooh T. Y. Kim D. Song Y. G. Lee T. K. Lee V. W. Bergmann S. A. L. Weber J. Bisquert Y. S. Kang K. Char ACS Appl. Mater. Interfaces 2015 4 46 25741 25747
-
(2015)
ACS Appl. Mater. Interfaces
, vol.4
, Issue.46
, pp. 25741-25747
-
-
Wooh, S.1
Kim, T.Y.2
Song, D.3
Lee, Y.G.4
Lee, T.K.5
Bergmann, V.W.6
Weber, S.A.L.7
Bisquert, J.8
Kang, Y.S.9
Char, K.10
-
47
-
-
84899760583
-
-
S. Srinivasa Rao C. V. V. M. Gopi K. Soo-Kyoung S. Min-Kyu J. Myeong-Soo A. D. Savariraj K. Prabakar K. Hee-Je Electrochim. Acta 2014 133 174 179
-
(2014)
Electrochim. Acta
, vol.133
, pp. 174-179
-
-
Srinivasa Rao, S.1
Gopi, C.V.V.M.2
Soo-Kyoung, K.3
Min-Kyu, S.4
Myeong-Soo, J.5
Savariraj, A.D.6
Prabakar, K.7
Hee-Je, K.8
-
57
-
-
84870289857
-
-
X. Zeng W. Zhang Y. Xie D. Xiong W. Chen X. Xu M. Wang Y. B. Cheng J. Power Sources 2013 226 359 362
-
(2013)
J. Power Sources
, vol.226
, pp. 359-362
-
-
Zeng, X.1
Zhang, W.2
Xie, Y.3
Xiong, D.4
Chen, W.5
Xu, X.6
Wang, M.7
Cheng, Y.B.8
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