Properties of aluminium oxide thin films deposited in high effective reactive pulsed magnetron sputtering process

Materials Science- Poland

Volumn 30, Issue 4, 2012, Pages 323-328

  Tadaszak, K ^a   Nitsch, K ^a   Piasecki, T ^a   Posadowski, W M ^a  

^a WROCLAW UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

aluminium oxide; impedance spectroscopy; reactive magnetron sputtering

Indexed keywords

EID: 84988971164     PISSN: 20831331     EISSN: 2083134X     Source Type: Journal    
DOI: 10.2478/s13536-012-0058-4     Document Type: Article

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