Stop-flow lithography to continuously fabricate microlens structures utilizing an adjustable three-dimensional mask

Micromachines

Volumn 5, Issue 3, 2014, Pages 667-680

  Huang, Shih Hao ^a   Lin, Chia Kai ^a  

^a NATIONAL TAIWAN OCEAN UNIVERSITY   (Taiwan)

Author keywords

Microlens; Photopolymerization; Stop flow lithography

Indexed keywords

ELECTRIC FORCE MICROSCOPY; ELECTROMAGNETIC WAVE ABSORPTION; ELECTROSTATIC DEVICES; ELECTROSTATIC FORCE; ELECTROSTATICS; LIGHT ABSORPTION; LITHOGRAPHY; MICROCHANNELS; MICROFLUIDICS; PHOTOLITHOGRAPHY; PHOTOPOLYMERIZATION; SUBSTRATES; THROUGHPUT;

MICRO-LENS; MICROCHANNEL SURFACES; MICROFLUIDIC ENVIRONMENT; MICROFLUIDIC-BASED; MICROOPTICAL SYSTEMS; POLYDIMETHYSILOXANE; STOP FLOW; TWO DIMENSIONAL (2 D);

MICROLENSES;

EID: 84987794567     PISSN: None     EISSN: 2072666X     Source Type: Journal    
DOI: 10.3390/mi5030667     Document Type: Article

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