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Volumn 4, Issue 21, 2016, Pages 8053-8060
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Ageing mechanisms of highly active and stable nickel-coated silicon photoanodes for water splitting
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Author keywords
[No Author keywords available]
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Indexed keywords
CATALYSTS;
MAGNETIC SEMICONDUCTORS;
METALLIC FILMS;
NICKEL;
NICKEL COATINGS;
PHOTOELECTROCHEMICAL CELLS;
POTASSIUM;
SILICON;
SILICON OXIDES;
FABRICATION COST;
FORMATION OF HOLE;
METAL-SILICON INTERFACES;
OXYGEN EVOLUTION REACTION;
PHOTOELECTROCHEMICALS;
SEMICONDUCTOR PHOTOELECTRODE;
SIMPLE STRUCTURES;
WATER SPLITTING;
X RAY PHOTOELECTRON SPECTROSCOPY;
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EID: 84973382102
PISSN: 20507488
EISSN: 20507496
Source Type: Journal
DOI: 10.1039/c5ta09990k Document Type: Article |
Times cited : (31)
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References (24)
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