Dynamics of the gas flow turbulent front in atmospheric pressure plasma jets

Plasma Sources Science and Technology

Volumn 25, Issue 3, 2016, Pages

  Pei, X ^a   Ghasemi, M ^a   Xu, H ^a   Hasnain, Q ^a   Wu, S ^a   Tu, Y ^a   Lu, X ^a  

^a HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

chemical vapor deposition (CVD); electronic transport; grain boundary; grapheme

Indexed keywords

ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; ATMOSPHERIC THERMODYNAMICS; CHARGE COUPLED DEVICES; CHEMICAL VAPOR DEPOSITION; FLOW OF GASES; GRAIN BOUNDARIES; HIGH SPEED CAMERAS; HIGH SPEED PHOTOGRAPHY; PHOTOMULTIPLIERS; PLASMA DIAGNOSTICS; PLASMA JETS; PULSE REPETITION RATE; TURBULENT FLOW;

ATMOSPHERIC PRESSURE PLASMA JETS; CHEMICAL VAPOR DEPOSITIONS (CVD); DYNAMIC CHARACTERIZATION; ELECTRONIC TRANSPORT; GRAPHEME; INTENSIFIED CHARGE COUPLED DEVICES; PULSE REPETITION FREQUENCIES; SCHLIEREN PHOTOGRAPHY;

ATMOSPHERIC TURBULENCE;

EID: 84973345082     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/25/3/035013     Document Type: Article

References (42)

1. Xiong Z L, Du T, Lu X P, Cao Y G and Pan Y 2011 Appl. Phys. Lett. 98 221503
2. Von Woedtke T, Reuter S, Masur K and Weltmann K D 2013 Phys. Rep. 530 291
3. Pei X K, Lu X P, Liu J H, Liu D W, Yang Y, Ostrikov K, Chu P K and Pan Y 2012 J. Phys. D: Appl. Phys. 45 165205
4. O'Connell D, Cox L J, Hyland W B, McMahon S J, Reuter S, Graham W G, Gans T and Currell F J 2011 Appl. Phys. Lett. 98 043701
5. Lu X P, Laroussi M and Puech V 2012 Plasma Sources Sci. Technol. 22 034005
6. Kim G C, Kim G J, Park S R, Jeon S M, Seo H J, Iza F and Lee J K 2009 J. Phys. D: Appl. Phys. 42 032005
7. Graves D B 2012 J. Phys. D: Appl. Phys. 45 263001
8. Dobrynin D, Fridman G, Friedman G and Fridman A 2009 New J. Phys. 11 115020
9. Reuter S, Niemi K, Schulz-von der Gathen V and Dobele H F 2009 Plasma Sources Sci. Technol. 18 015006
10. Laroussi M 2005 Plasma Process. Polym. 2 391
11. Kredl J, Drache S, Quade A, Polak M, Muller S, Peglow S, Hippler R and Kolb J F 2014 IEEE Trans. Plasma Sci. 42 2756
12. Lehmann A, Rueppell A, Schindler A, Zylla I M, Seifert H J, Nothdurft F, Hannig M and Rupf S 2013 Plasma Process. Polym. 10 262
13. Ye D, Wu S Q, Yu Y, Liu L, Lu X P and Wu Y 2014 Appl. Phys. Lett. 104 103105
14. Cvelbar U 2011 J. Phys. D: Appl. Phys. 44 174014
15. Shashurin A, Li J, Zhuang T, Keidar M and Beilis I I 2011 Phys. Plasmas 18 073505
16. Ostrikov K, Neyts E C and Meyyappan M 2013 Adv. Phys. 62 113
17. Choi Y H, Kim J H, Paek K H, Ju W T and Hwang Y S 2005 Surf. Coat. Technol. 193 319
18. Cheng C, Zhang L Y and Zhan R J 2006 Surf. Coat. Technol. 200 6659
19. Fricke K, Steffen H, von Woedtke T, Schroder K and Weltmann K D 2011 Plasma Process. Polym. 8 51
20. Robert E, Sarron V, Ries D, Dozias S, Vandamme M and Pouvesle J M 2012 Plasma Sources Sci. Technol. 21 034017
21. Gherardi M, Puac N, Maric D, Stancampiano A, Malovic G, Colombo V and Petrovic Z L 2015 Plasma Sources Sci. Technol. 24 064004
22. Maletic D, Puac N, Selakovic N, Lazovic S, Malovic G, Dordevic A and Petrovi Z L 2015 Plasma Sources Sci. Technol. 24 025006
23. Boselli M, Colombo V, Gherardi M, Laurita R, Liguori A, Sanibondi P, Simoncelli E and Stancampiano A 2015 IEEE Trans. Plasma Sci. 43 713
24. Xian Y B, Lu X P, Wu S Q, Chu P K and Pan Y 2012 Appl. Phys. Lett. 100 123702
25. Karakas E, Koklu M and Laroussi M 2010 J. Phys. D: Appl. Phys. 43 155202
26. Thomas F O, Corke T C, Iqbal M, Kozlov A and Schatzman D 2009 AIAA J. 47 2169
27. Debien A, Benard N and Moreau E 2012 J. Phys. D: Appl. Phys. 45 215201
28. Roth J R 2003 Phys. Plasmas 10 2117
29. Boeuf J P, Lagmich Y, Unfer T, Callegari T and Pitchford L C 2007 J. Phys. D: Appl. Phys. 40 652
30. Xiong R H, Xiong Q, Nikiforov A Y, Vanraes P and Leys C 2012 J. Appl. Phys. 112 033305
31. Jiang N, Yang J L, He F and Cao Z X 2011 J. Appl. Phys. 109 093305
32. Papadopoulos P K, Vafeas P, Svarnas P, Gazeli K, Hatzikonstantinou P M, Gkelios A and Clement F 2014 J. Phys. D: Appl. Phys. 47 425203
33. Ghasemi M, Olszewski P, Bradley J W and Walsh J L 2013 J. Phys. D: Appl. Phys. 46 052001
34. Oh J S, Olabanji O T, Hale C, Mariani R, Kontis K and Bradley J W 2011 J. Phys. D: Appl. Phys. 44 155206
35. Bradley J W, Oh J S, Olabanji O T, Hale C, Mariani R and Kontis K 2011 IEEE Trans. Plasma Sci. 39 2312
36. Robert E, Sarron V, Darny T, Ries D, Dozias S, Fontane J, Joly L and Pouvesle J M 2014 Plasma Sources Sci. Technol. 23 012003
37. Zhang S, Sobota A, van Veldhuizen E M and Bruggeman P J 2015 J. Phys. D: Appl. Phys. 48 015203
38. Foletto M, Puech V, Fontane J, Joly L and Pitchford L C 2014 IEEE Trans. Plasma Sci. 42 2436
39. Boselli M, Colombo V, Ghedini E, Gherardi M, Laurita R, Liguori A, Sanibondi P and Stancampiano A 2014 Plasma Chem. Plasma Process. 34 853
40. Xiong Q et al 2010 J. Appl. Phys. 107 073302
41. Pei X K, Lu Y, Wu S Q, Xiong Q and Lu X P 2013 Plasma Sources Sci. Technol. 22 025023
42. Robert E, Darny T, Dozias S, Iseni S and Pouvesle J M 2015 Phys. Plasmas 22 122007