Contact characterization between multi-walled carbon nanotubes and metal electrodes

IEEE-NANO 2015 - 15th International Conference on Nanotechnology

Volumn , Issue , 2015, Pages 1386-1389

  Shi, Qing ^a   Yu, Ning ^a   Huang, Qiang ^a   Fukuda, Toshio ^a   Nakajima, Masahiro ^b   Yang, Zhan ^c  

^a BEIJING INSTITUTE OF TECHNOLOGY   (China)

^b NAGOYA UNIVERSITY   (Japan)

^c SOOCHOW UNIVERSITY   (China)

Author keywords

carbon nanotubes; contact resistance; nanorobotics

Indexed keywords

ATOMIC FORCE MICROSCOPY; CARBON NANOTUBE FIELD EFFECT TRANSISTORS; CARBON NANOTUBES; CONTACT RESISTANCE; DEPOSITS; ELECTRODES; FIELD EFFECT TRANSISTORS; GOLD COATINGS; GOLD DEPOSITS; NANOCANTILEVERS; NANOROBOTICS; NANOTECHNOLOGY; NANOTUBES; SUBSTRATES; TUNGSTEN; TUNGSTEN DEPOSITS; YARN;

AFM CANTILEVERS; ATOMIC FORCE MICROSCOPE CANTILEVERS; CONTACT PROPERTIES; ELECTRON BEAM-INDUCED DEPOSITION; GOLD COATED GLASS; METAL ELECTRODES; NANOROBOTIC MANIPULATION SYSTEMS; THEORETICAL MODELING;

MULTIWALLED CARBON NANOTUBES (MWCN);

EID: 84964389772     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/NANO.2015.7388895     Document Type: Conference Paper

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