Simulation and experimental study of gray-tone lithography for the fabrication of arbitrarily shaped surfaces

Proceedings of the IEEE Micro Electro Mechanical Systems

Volumn , Issue , 1994, Pages 205-210

  Henke, W ^a   Hoppe, W ^a   Quenzer, H J ^a   Staudt Fischbach, P ^a   Wagner, B ^a  

^a FRAUNHOFER INSTITUTE FOR SILICON TECHNOLOGY ISIT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COMPONENTS; FABRICATION; MASKS; MATHEMATICAL MODELS; SEMICONDUCTING SILICON; STRUCTURE (COMPOSITION); SURFACES;

GRAY TONE LITHOGRAPHY; HALFTONE REPRODUCTION PROCESS; QUARTZ CHROMIUM RETICLE; SURFACE CONTOURS; WAFER;

LITHOGRAPHY;

EID: 0028053387     PISSN: None     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (9)