Fabrication of single crystal silicon field emitter array on glass substrate

2001 International Microprocesses and Nanotechnology Conference, MNC 2001

Volumn , Issue , 2001, Pages 260-261

  Higa, K ^a   Asano, T ^b  

^a OSHIMA NATIONAL COLLEGE OF MARITIME TECHNOLOGY   (Japan)

^b KYUSHU INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COLD CATHODE TUBES; DISPLAY DEVICES; FABRICATION; FIELD EMISSION; GLASS; GLASS BONDING; MONOCRYSTALLINE SILICON; NANOTECHNOLOGY; SILICON; SILICON WAFERS; SINGLE CRYSTALS; WAFER BONDING;

ANODIC BONDING PROCESS; FIELD EMITTER ARRAYS; FIELD-EMISSION CHARACTERISTICS; GLASS SUBSTRATES; SILICON FIELD EMITTER ARRAYS; SILICON SUBSTRATES; SINGLE CRYSTAL SILICON; TRANSPARENT SUBSTRATE;

SUBSTRATES;

EID: 84960428327     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IMNC.2001.984188     Document Type: Conference Paper

References (5)

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3. K. Higa and T. Asano: Jpn. J. Appl. Phys. 35(1996)6648.
4. K. Higa, K. Nishii and T. Asano: Jpn. J. Appl. Phys. 36(1997)7741.
5. D. J. Lee, et. al: Jpn. J. Appl. Phys. 38(1999)1.