Nano-imprint lithography using replicated mold by Ni electro plating

2001 International Microprocesses and Nanotechnology Conference, MNC 2001

Volumn , Issue , 2001, Pages 182-183

  Hirai, Y ^a   Harada, S ^a   Isaka, S ^b   Kobayashi, M ^b   Tanaka, Y ^a  

^a Osaka Prefecture University   (Japan)

^b Hikifune Co Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; MOLDS; NANOTECHNOLOGY; NICKEL;

ELECTRO PLATINGS; HIGH ASPECT RATIO PATTERNS;

NANOIMPRINT LITHOGRAPHY;

EID: 84960411429     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IMNC.2001.984150     Document Type: Conference Paper

References (4)

1. S. Chou, et al., "Nanoimprint lithography",J. Vac. Sci. Technol. B14, pp.4129-4133,1996.
2. H. Herzing, Micro-optics, Taylor & Francis, London,1997.
3. P.Palermo, et al., "Video disc mastering and repliucation", Optics and Laser Tech. 9, pp.169-174,1977.
4. Y.Hirai, et al., "Mold Surface Treatment for Imprint Lithography", J. Photopolym. Sci. Technol., 14, pp.457-46, 2001.