Reproducibility of XPS analysis for film thickness of SiO2/Si by active Shirley method

Journal of Electron Spectroscopy and Related Phenomena

Volumn 207, Issue , 2016, Pages 55-59

  Matsumoto, Ryo ^a,b,c   Nishizawa, Yugo ^a   Kataoka, Noriyuki ^a   Tanaka, Hiromi ^a   Yoshikawa, Hideki ^c   Tanuma, Shigeo ^c   Yoshihara, Kazuhiro ^d  

^a YONAGO NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

^b UNIVERSITY OF TSUKUBA   (Japan)

^c NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^d Scienta Omicron Inc   (Japan)

Author keywords

Active Shirley method; Background estimation; X ray photoelectron spectroscopy

Indexed keywords

PHOTOELECTRON SPECTROSCOPY; PHOTOELECTRONS; PHOTONS; SILICON WAFERS;

AUTOMATIC TUNING; BACKGROUND ESTIMATION; BACKGROUND SPECTRA; REPRODUCIBILITIES; SHIRLEY METHOD; SOFTWARE ALGORITHMS; VOIGT FUNCTIONS; XPS ANALYSIS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 84956979476     PISSN: 03682048     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.elspec.2015.12.008     Document Type: Article

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