|
Volumn , Issue , 2001, Pages 110-113
|
Measurement and modeling of thermal resistance of high speed SiGe heterojunction bipolar transistors
a
IBM
(United States)
|
Author keywords
Electrical resistance measurement; Geometry; Germanium silicon alloys; Length measurement; Resistance heating; Silicon germanium; Solid modeling; Temperature; Thermal resistance; Velocity measurement
|
Indexed keywords
BICMOS TECHNOLOGY;
GEOMETRY;
GERMANIUM;
GERMANIUM ALLOYS;
HEAT RESISTANCE;
HETEROJUNCTIONS;
INTEGRATED CIRCUITS;
MONOLITHIC INTEGRATED CIRCUITS;
SILICON;
SILICON ALLOYS;
TEMPERATURE;
VELOCITY MEASUREMENT;
ELECTRICAL RESISTANCE MEASUREMENT;
GERMANIUM SILICON ALLOY;
LENGTH MEASUREMENT;
RESISTANCE-HEATING;
SILICON GERMANIUM;
SOLID MODEL;
HETEROJUNCTION BIPOLAR TRANSISTORS;
|
EID: 84951942739
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/SMIC.2001.942350 Document Type: Conference Paper |
Times cited : (70)
|
References (8)
|