Growth of poly crystalline diamond films for low field electron emission

ASDAM 2000 - Conference Proceedings: 3rd International EuroConference on Advanced Semiconductor Devices and Microsystems

Volumn , Issue , 2000, Pages 209-213

  Malcher, V ^a   Kromka, A ^a   Janik J ^a   Dubravcova V ^a  

^a SLOVAK UNIVERSITY OF TECHNOLOGY   (Slovakia)

Author keywords

Cold cathodes; Double bias assisted hot filament CVD method; Field emission of diamond films; Micro Raman spectra

Indexed keywords

CATHODES; CHEMICAL VAPOR DEPOSITION; COLD CATHODE TUBES; DEPOSITION; DIAMONDS; ELECTRODES; ELECTRON AFFINITY; ELECTRON EMISSION; FIELD EMISSION CATHODES; FIELD EMISSION DISPLAYS; FILM GROWTH; MICROSYSTEMS; SEMICONDUCTOR DEVICES; TUNGSTEN; VAPOR DEPOSITION;

COLD CATHODE APPLICATIONS; COLD CATHODES; ELECTRON FIELD EMISSION PROPERTIES; HOT FILAMENT CVD; HOT-FILAMENT CHEMICAL VAPOR DEPOSITION; LOW-FIELD ELECTRON EMISSION; MICRO-RAMAN SPECTRA; NEGATIVE ELECTRON AFFINITY;

DIAMOND FILMS;

EID: 84951914935     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ASDAM.2000.889482     Document Type: Conference Paper

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