Enhanced field emission of plasma treated multilayer graphene

Applied Physics Letters

Volumn 107, Issue 12, 2015, Pages

  Khare, Ruchita T ^a   Gelamo, Rogerio V ^b   More, Mahendra A ^a   Late, Dattatray J ^c   Rout, Chandra Sekhar ^d  

^a UNIVERSITY OF PUNE   (India)

^b FEDERAL UNIVERSITY OF TRIÂNGULO MINEIRO   (Brazil)

^c NATIONAL CHEMICAL LABORATORY   (India)

^d INDIAN INSTITUTE OF TECHNOLOGY BHUBANESWAR   (India)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON DIOXIDE; ELECTRON EMISSION; FIELD EMISSION; MULTILAYERS; PLASMA APPLICATIONS; PLASMA STABILITY;

CURRENT STABILITY; ELECTRON EMISSION PROPERTIES; EMISSION CURRENT; ENHANCED FIELD EMISSION; HIGH EMISSION CURRENT DENSITY; MULTILAYER GRAPHENE; PLASMA TREATMENT; TURN-ON FIELD;

GRAPHENE;

EID: 84951729660     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4931626     Document Type: Article

References (27)

1. M. S. Fuhrer, C. N. Lau, and A. H. MacDonald, MRS Bull. 35, 289-295 (2010). 10.1557/mrs2010.551
2. G. Eda, H. E. Unalan, N. Rupesinghe, G. A. J. Amaratunga, and M. Chhowalla, Appl. Phys. Lett. 93, 233502 (2008). 10.1063/1.3028339
3. P. Hojati-Talemi and G. P. Simon, Carbon 49, 2875-2877 (2011). 10.1016/j.carbon.2011.03.004
4. C. K. Huang, Y. X. Ou, Y. Q. Bie, Q. Zhao, and D. P. Yu, Appl. Phys. Lett. 98, 263104 (2011). 10.1063/1.3603963
5. J. H. Deng, X. G. Hou, L. Cheng, F. J. Wang, B. Yu, G. Z. Li, D. J. Li, G. A. Cheng, and S. Wu, ACS Appl. Mater. Interfaces 6, 5137-5143 (2014). 10.1021/am500370b
6. R. H. Baughman, A. A. Zakhidov, and W. A. de Heer, Science 297, 787-792 (2002). 10.1126/science.1060928
7. U. A. Paltnitakar, R. V. Kashid, M. A. More, D. S. Joag, L. S. Panchakarla, and C. N. R. Rao, Appl. Phys. Lett. 97 (6), 063102 (2010). 10.1063/1.3464168
8. R. V. Kashid, L. S. Panchakarla, S. D. Dhole, M. A. More, and D. S. Joag, Radiat. Eff. Defects Solids 169 (5), 447-456 (2014). 10.1080/10420150.2014.905938
9. C. S. Rout, P. D. Joshi, R. V. Kashid, D. S. Joag, M. A. More, A. J. Simbeck, M. Washington, S. K. Nayak, and D. J. Late, Appl. Phys. Lett. 105, 043109 (2014). 10.1063/1.4892001
10. N. Soin, S. S. Roy, S. Roy, K. S. Hazra, D. S. Misra, T. H. Lim, C. J. Hetherington, and J. A. McLaughlin, J. Phys. Chem. C 115 (13), 5366-5372 (2011). 10.1021/jp110476m
11. Y. Sui and J. Appenzeller, Nano Lett. 9, 2973 (2009). 10.1021/nl901396g
12. V. T. Nguyen, H. D. Le, V. C. Nguyen, T. Thanh, T. Ngo, D. Q. Le, X. N. Nguyen, and N. M. Phan, Adv. Nat. Sci.: Nanosci. Nanotechnol. 4, 035012 (2013). 10.1088/2043-6262/4/3/035012
13. H. J. Park, B. W. Ahn, T. Y. Kim, J. W. Lee, Y. S. Choi, Y. Song, and S. J. Suh, Thin Solid Films 587, 8-13 (2015). 10.1016/j.tsf.2015.01.011
14. J. H. Denga, L. Chenga, F. J. Wanga, D. J. Lia, and G. A. Cheng, Mater. Lett. 138, 175-178 (2015). 10.1016/j.matlet.2014.09.124
15. K. Nakakubo, K. Asaka, H. Nakahara, and Y. Saito, Appl. Phys. Express 5, 055101 (2012). 10.1143/APEX.5.055101
16. S. Sonde, F. Giannazzo, V. Raineri, and E. Rimini, J. Vac. Sci. Technol., B 27, 868 (2009). 10.1116/1.3081890
17. A. Gupta, G. Chen, P. Joshi, S. Tadigadapa, and P. C. Eklund, Nano. Lett. 6, 2667 (2006). 10.1021/nl061420a
18. A. M. Dimiev, A. Gizzatov, L. J. Wilson, and J. M. Tour, Chem. Commun. 49, 2613 (2013). 10.1039/c3cc40424b
19. I. Childres, L. A. Jauregui, W. Park, H. Cao, and Y. P. Chen, Raman Spectroscopy of Graphene and Related Materials (Nova Science Publishers, New York, 2013), Chap. 19.
20. R. H. Fowler and L. Nordheim, Proc. R. Soc. London, Ser. A 119, 173 (1928). 10.1098/rspa.1928.0091
21. R. G. Forbes, J. Appl. Phys. 103, 114911 (2008). 10.1063/1.2937077
22. B. D. Banerjee, S. H. Jo, and Z. F. Ren, Adv. Mater. 16, 2028 (2004). 10.1002/adma.200400629
23. S.-Y. Kuo and H.-I. Lin, Nanoscale Res. Lett. 9, 70 (2014). 10.1186/1556-276X-9-70
24. G. N. Fursey and L. M. Baskin, Mikroelektronika 26, 117 (1997).
25. L. M. Baskin, Ph.D. dissertation, Tomsk, 1990.
26. L. M. Baskin and G. N. Fursey, in Proceedings of the 13th ISDEIV (1998), p. 31.
27. 2 plasma treated MLG for different time.