Quantifying the capability of a new in-situ interferometer

ASMC (Advanced Semiconductor Manufacturing Conference) Proceedings

Volumn 2000-January, Issue , 2000, Pages 407-412

  Roberts, B ^a   Guerrero, J ^c   Gould, C ^a   Ribitz, K ^b   Smith, A ^b  

^a INFINEON TECHNOLOGIES   (United States)

^b Litel Instruments   (United States)

^c ROCHESTER INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

Adaptive optics; Distortion measurement; Interferometric lithography; Optical design; Optical distortion; Optical imaging; Optical interferometry; Optical sensors; Phase measurement; Testing

Indexed keywords

ABERRATIONS; ACCEPTANCE TESTS; INTERFEROMETERS; INTERFEROMETRY; MANUFACTURE; OPTICAL DESIGN; OPTICAL SENSORS; PHASE MEASUREMENT; PHOTOLITHOGRAPHY; SEMICONDUCTOR DEVICE MANUFACTURE; SENSITIVITY ANALYSIS; TESTING;

DISTORTION MEASUREMENT; INTERFEROMETRIC LITHOGRAPHY; OPTICAL DISTORTION; OPTICAL IMAGING; OPTICAL INTERFEROMETRY;

ADAPTIVE OPTICS;

EID: 84949797822     PISSN: 10788743     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ASMC.2000.902619     Document Type: Conference Paper

References (5)

1. N. Farrar et. al. "In-Situ measurement of lens aberrations" Proceedings of SPIE Vol. 4000-03(2000)
2. N. Seong, H. Cho, J. Moon S. Lee "Measurement of lens aberrations by using an in-situ Interferometer and classification of lens for correct application", Proceedings of SPIE Vol. 4000-04 (2000)
3. J. Kirk "Review of photoresist based Lens Evaluation Methods", Proceedings of SPIE Vol. 4000-01 (2000)
4. P. Dirksen et. al. Impact of high order aberrations on the performance of the aberration monitor" Proceedings of SPIE Vol. 4000-01 (2000)
5. C. Gould, B. Roberts, F. Goodwin, "Overlay Measurement Sampling - Hidden Errors", Proceedings of SPIE Vol. 3998-47 (2000)