Passive and active probe arrays for Dip-Pen Nanolithography

Proceedings of the IEEE Conference on Nanotechnology

Volumn 2001-January, Issue , 2001, Pages 27-31

  Zhang, Ming ^a   Bullen, David ^a   Ryu, Kee S ^a   Liu, Chang ^a   Hong, Seunghun ^b   Chung, Sung Wook ^b   Mirkin, Chad A ^b  

^a University of Illinois at Urbana Champaign   (United States)

^b NORTHWESTERN UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; NANOTECHNOLOGY; PROBES;

ACTIVE PROBE; DIP-PEN NANOLITHOGRAPHY; HIGH SPEED; MICROMACHINING TECHNIQUES; PROBE ARRAY; SUB-100 NM;

NANOLITHOGRAPHY;

EID: 84949236456     PISSN: 19449399     EISSN: 19449380     Source Type: Conference Proceeding    
DOI: 10.1109/NANO.2001.966387     Document Type: Conference Paper

References (5)

1. R. Piner et al., "Dip-Pen" Nanolithography, Science, 1999, v. 283, pp. 661-663
2. S. Hong et al., Multiple Ink Nanolithography: Toward a Multiple-Pen Nano-Plotter, 1999, v. 286, pp. 523-525
3. C. Liu and R. Gamble, Mass-producible monolithic silicon probes for scanning probe microscopes, Sensors and Actuators A, 1998, v. 71, pp. 233-237.
4. B. Maynor et al., Au "Ink" for AFM "Dip-Pen" Nanolithography, Langmuir, 2001, v. 17, pp. 2575-2578.
5. S. Hong et. al., A Nanoplotter with Both Parallel and Serial Writing Capabilities, Science, v. 288, pp. 1808-1811.