Remarkable Conversion between n- and p-Type Reduced Graphene Oxide on Varying the Thermal Annealing Temperature

Chemistry of Materials

Volumn 27, Issue 21, 2015, Pages 7362-7369

  Tu, Nguyen Dien Kha ^a,b   Choi, Jaeyoo ^a,c   Park, Chong Rae ^c   Kim, Heesuk ^a,b  

^a Korea Institute of Science and Technology   (South Korea)

^b University of Science and Technology (UST)   (South Korea)

^c Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ETHERS;

ANNEALING TEMPERATURES; ELECTRON WITHDRAWING GROUP; ELECTRON-DONATING GROUP; LARGE SCALE PRODUCTIONS; NANOELECTRONIC APPLICATIONS; OXYGEN FUNCTIONAL GROUPS; REDUCED GRAPHENE OXIDES; REDUCED GRAPHENE OXIDES (RGO);

GRAPHENE;

EID: 84946888128     PISSN: 08974756     EISSN: 15205002     Source Type: Journal    
DOI: 10.1021/acs.chemmater.5b02999     Document Type: Article

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