Structural defects and electronic structure of N-ion implanted TiO 2 : Bulk versus thin film

Applied Surface Science

Volumn 355, Issue , 2015, Pages 984-988

  Zatsepin, D A ^a,b   Boukhvalov, D W ^c,d   Kurmaev, E Z ^a,b   Zhidkov, I S ^b   Gavrilov, N V ^e   Korotin, M A ^a   Kim, S S ^f  

^a INSTITUTE OF METAL PHYSICS   (Russian Federation)

^b URAL FEDERAL UNIVERSITY   (Russian Federation)

^c Hanyang University   (South Korea)

^d URAL FEDERAL UNIVERSITY   (Russian Federation)

^e INSTITUTE OF ELECTROPHYSICS   (Russian Federation)

^f Inha University   (South Korea)

Author keywords

Density functional calculations; Ion implantation; X ray photoelectron spectroscopy

Indexed keywords

CALCULATIONS; DENSITY FUNCTIONAL THEORY; ELECTRONIC STRUCTURE; ENERGY GAP; ION IMPLANTATION; IONS; OXYGEN VACANCIES; TITANIUM DIOXIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

BAND GAP REDUCTION; BULK CERAMICS; FIRST PRINCIPLES DENSITY FUNCTIONAL THEORY (DFT) CALCULATIONS; INTERSTITIAL NITROGEN; ION IMPLANTED; STRUCTURAL DEFECT; THEORETICAL MODELING; XPS MEASUREMENTS;

THIN FILMS;

EID: 84944338899     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2015.07.190     Document Type: Article

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