Application of adaptive multilevel substructuring technique to model CMOS micromachined thermistor gas sensor, part (II): Effect of manufacturing uncertainties in the reliability of MEMS

Proceedings - International Conference on MEMS, NANO and Smart Systems, ICMENS 2003

Volumn , Issue , 2003, Pages 390-395

  Sadek, K ^a   Moussa, W ^a  

^a UNIVERSITY OF ALBERTA   (Canada)

Author keywords

Character generation; CMOS technology; Gas detectors; Micromechanical devices; Numerical models; Residual stresses; Semiconductor device modeling; Thermistors; Uncertainty; Virtual manufacturing

Indexed keywords

AGILE MANUFACTURING SYSTEMS; CMOS INTEGRATED CIRCUITS; DEPOSITION; ELASTIC MODULI; FATIGUE OF MATERIALS; GAS DETECTORS; MANUFACTURE; NANOSENSORS; RESIDUAL STRESSES; SEMICONDUCTOR DEVICE MODELS; SEMICONDUCTOR DEVICES; THERMISTORS; UNCERTAINTY ANALYSIS;

CHARACTER GENERATION; CMOS TECHNOLOGY; MICROMECHANICAL DEVICE; UNCERTAINTY; VIRTUAL MANUFACTURING;

NUMERICAL MODELS;

EID: 84943737499     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICMENS.2003.1222029     Document Type: Conference Paper

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