High damage tolerance of electrochemically lithiated silicon

Nature Communications

Volumn 6, Issue , 2015, Pages

  Wang, Xueju ^a   Fan, Feifei ^a   Wang, Jiangwei ^b   Wang, Haoran ^c   Tao, Siyu ^a   Yang, Avery ^a   Liu, Yang ^d   Beng Chew, Huck ^c   Mao, Scott X ^b   Zhu, Ting ^a   Xia, Shuman ^a  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

^b University of Pittsburgh   (United States)

^c University of Illinois at Urbana Champaign   (United States)

^d SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LITHIUM; NANOWIRE; SILICON;

AMORPHOUS MEDIUM; ELECTRODE; ELECTROKINESIS; LITHIUM; MOLECULAR ANALYSIS; NANOTECHNOLOGY; PERFORMANCE ASSESSMENT; QUANTITATIVE ANALYSIS; SILICON; TENSILE STRESS;

AB INITIO CALCULATION; ARTICLE; COMPRESSION; DIFFUSION; ELECTROCHEMISTRY; ELECTRODE; LITHIATION; MOLECULAR DYNAMICS; MOLECULAR MECHANICS; PARTICLE SIZE; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY;

EID: 84942155007     PISSN: None     EISSN: 20411723     Source Type: Journal    
DOI: 10.1038/ncomms9417     Document Type: Article

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