Performance of 100-W HVM LPP-EUV source

Advanced Optical Technologies

Volumn 4, Issue 4, 2015, Pages 297-309

  Mizoguchi, Hakaru ^a   Nakarai, Hiroaki ^a   Abe, Tamotsu ^a   Nowak, Krzysztof M ^a   Kawasuji, Yasufumi ^a   Tanaka, Hiroshi ^a   Watanabe, Yukio ^a   Hori, Tsukasa ^a   Kodama, Takeshi ^a   Shiraishi, Yutaka ^a   Yanagida, Tatsuya ^a   Soumagne, Georg ^a   Yamada, Tsuyoshi ^a   Yamazaki, Taku ^a   Okazaki, Shinji ^a   Saitou, Takashi ^a  

^a GIGAPHOTON INC   (Japan)

Author keywords

13.5 nm; carbon dioxide (CO2) laser; extreme ultraviolet (EUV) light source; high volume manufacturing (HVM); laser produced plasma (LPP); lithography; tin (Sn)

Indexed keywords

EID: 84941641549     PISSN: 21928576     EISSN: 21928584     Source Type: Journal    
DOI: 10.1515/aot-2015-0025     Document Type: Review

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