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Volumn 596, Issue , 2015, Pages 77-82

On-axis radio frequency magnetron sputtering of stoichiometric BaTiO3 target: Localized re-sputtering and substrate etching during thin film growth

(8) Vargas, F A a Nouar, R b Said Bacar, Z a Higuera, B a Porter, R b Sarkissian, A b Thomas, R a Ruediger, A a

a INRS EMT (Canada)

b Plasmionique Inc (Canada)

Author keywords

BaTiO3; Ferroelectric thin films; Sputtering; Substrate etching

Indexed keywords

ALUMINUM COMPOUNDS; BARIUM TITANATE; ETCHING; FERROELECTRIC FILMS; FERROELECTRIC THIN FILMS; FILM GROWTH; MAGNETRON SPUTTERING; NEGATIVE IONS; NIOBIUM COMPOUNDS; OPTICAL EMISSION SPECTROSCOPY; OXYGEN; PLATINUM COMPOUNDS; RADIO WAVES; SILICON COMPOUNDS; SPUTTERING; STRONTIUM TITANATES; SUBSTRATES; X RAY PHOTOELECTRON SPECTROSCOPY;

BATIO3; BATIO3 THIN FILMS; NEGATIVE OXYGEN IONS; OXYGEN PARTIAL PRESSURE; PROCESSING PARAMETERS; RADIO FREQUENCY MAGNETRON SPUTTERING; SUBSTRATE ETCHING; THRESHOLD POWER DENSITY;

THIN FILMS;

EID: 84938635318 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2015.07.065 Document Type: Conference Paper

Times cited : (13)

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