How Growing Conditions and Interfacial Oxygen Affect the Final Morphology of MgO/Ag(100) Films

Journal of Physical Chemistry C

Volumn 118, Issue 45, 2014, Pages 26091-26102

  Pal, J ^a,b   Smerieri, M ^a   Celasco, E ^a,b   Savio, L ^a   Vattuone, L ^a,b   Ferrando, R ^a,b   Tosoni, S ^c   Giordano, L ^c   Pacchioni, G ^c   Rocca, M ^a,b  

^a IMEM CNR   (Italy)

^b UNIVERSITY OF GENOA   (Italy)

^c UNIVERSITY OF MILANO BICOCCA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CALCULATIONS; DEPOSITION; ELECTRON ENERGY LEVELS; ELECTRON ENERGY LOSS SPECTROSCOPY; ELECTRON SCATTERING; ENERGY DISSIPATION; FILM GROWTH; INTERFACES (MATERIALS); MAGNESIA; OXIDE FILMS; PHOTOELECTRON SPECTROSCOPY; SCANNING TUNNELING MICROSCOPY; SILVER; TEMPERATURE;

AB INITIO CALCULATIONS; DEPOSITION TEMPERATURES; HIGH RESOLUTION ELECTRON ENERGY LOSS SPECTROSCOPY; LOW TEMPERATURE EQUILIBRIUM; REACTIVE DEPOSITION; STABLE CONFIGURATION; TECHNOLOGICAL APPLICATIONS; X RAY PHOTOEMISSION SPECTROSCOPY;

ULTRATHIN FILMS;

EID: 84930956607     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp507718n     Document Type: Article

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