-
1
-
-
34547905416
-
-
N. Hayashi, W. Guan, S. Tsutsui, T. Tomari, and Y. Hanada, Jpn. J. Appl. Phys. 45, 8358 (2006).
-
(2006)
Jpn. J. Appl. Phys.
, vol.45
, pp. 8358
-
-
Hayashi, N.1
Guan, W.2
Tsutsui, S.3
Tomari, T.4
Hanada, Y.5
-
2
-
-
18844417421
-
-
M. Vleugels, G. Shama, X. T. Deng, E. Greenacre, T. Brocklehurst, and M. G. Kong, IEEE Trans. Plasma Sci. 33, 824 (2005).
-
(2005)
IEEE Trans. Plasma Sci.
, vol.33
, pp. 824
-
-
Vleugels, M.1
Shama, G.2
Deng, X.T.3
Greenacre, E.4
Brocklehurst, T.5
Kong, M.G.6
-
3
-
-
13844255021
-
-
T. Akitsu, H. Ohkawa, M. Tsuji, H. Kimura, and M. Kogoma, Surf. Coatings Technol. 193, 29 (2005).
-
(2005)
Surf. Coatings Technol.
, vol.193
, pp. 29
-
-
Akitsu, T.1
Ohkawa, H.2
Tsuji, M.3
Kimura, H.4
Kogoma, M.5
-
4
-
-
84930613181
-
-
mrss12-1469-ww06-10f
-
Y. Akiyoshi, N. Hayashi, S. Kitazaki, K. Koga, and M. Shiratani, MRS Proc. 1469, mrss12-1469-ww06-10f (2012).
-
(2012)
MRS Proc.
, vol.1469
-
-
Akiyoshi, Y.1
Hayashi, N.2
Kitazaki, S.3
Koga, K.4
Shiratani, M.5
-
5
-
-
84866286559
-
-
T. G. Klampfl, G. Isbary, T. Shimizu, Y. Li, J. L. Zimmermann, W. Stolz, J. Schlegel, G. E. Morfill, and H. Schmidt, Appl. Environ. Microbiol. 78, 5077 (2012).
-
(2012)
Appl. Environ. Microbiol.
, vol.78
, pp. 5077
-
-
Klampfl, T.G.1
Isbary, G.2
Shimizu, T.3
Li, Y.4
Zimmermann, J.L.5
Stolz, W.6
Schlegel, J.7
Morfill, G.E.8
Schmidt, H.9
-
7
-
-
23044458472
-
-
H. D. Stryczewska, K. Ebihara, M. Takayama, Y. Gyoutoku, and M. Tachibana, Plasma Processes Polym. 2, 238 (2005).
-
(2005)
Plasma Processes Polym.
, vol.2
, pp. 238
-
-
Stryczewska, H.D.1
Ebihara, K.2
Takayama, M.3
Gyoutoku, Y.4
Tachibana, M.5
-
8
-
-
84875961397
-
-
K. Takaki, J. Takahata, S. Watanabe, N. Satta, O. Yamada, T. Fujio, and Y. Sasaki, J. Phys.: Conf. Ser. 418, 012140 (2013).
-
(2013)
J. Phys.: Conf. Ser.
, vol.418
, pp. 012140
-
-
Takaki, K.1
Takahata, J.2
Watanabe, S.3
Satta, N.4
Yamada, O.5
Fujio, T.6
Sasaki, Y.7
-
9
-
-
7244255753
-
-
E. A. Sosnin, E. Stoffels, M. V. Erofeev, I. E. Kieft, and S. E. Kunts, IEEE Trans. Plasma Sci. 32, 1544 (2004).
-
(2004)
IEEE Trans. Plasma Sci.
, vol.32
, pp. 1544
-
-
Sosnin, E.A.1
Stoffels, E.2
Erofeev, M.V.3
Kieft, I.E.4
Kunts, S.E.5
-
10
-
-
0034528038
-
-
J. C. Volin, F. S. Denes, R. A. Young, and S. M. T. Park, Crop Sci. 40, 1706 (2000).
-
(2000)
Crop Sci.
, vol.40
, pp. 1706
-
-
Volin, J.C.1
Denes, F.S.2
Young, R.A.3
Park, S.M.T.4
-
11
-
-
84892700936
-
-
J. Jiang, X. He, L. Li, J. Li, H. Shao, Q. Xu, R. Ye, and Y. Dong, Plasma Sci. Technol. 16, 54 (2014).
-
(2014)
Plasma Sci. Technol.
, vol.16
, pp. 54
-
-
Jiang, J.1
He, X.2
Li, L.3
Li, J.4
Shao, H.5
Xu, Q.6
Ye, R.7
Dong, Y.8
-
12
-
-
84897408682
-
-
J. Tong, R. He, X. Zhang, R. Zhan, W. Chen, and S. Yang, Plasma Sci. Technol. 16, 260 (2014).
-
(2014)
Plasma Sci. Technol.
, vol.16
, pp. 260
-
-
Tong, J.1
He, R.2
Zhang, X.3
Zhan, R.4
Chen, W.5
Yang, S.6
-
13
-
-
29444445209
-
-
Y. Meiqiang, H. Mingjing, M. Buzhou, and M. Tengcai, Plasma Sci. Technol. 7, 3143 (2005).
-
(2005)
Plasma Sci. Technol.
, vol.7
, pp. 3143
-
-
Meiqiang, Y.1
Mingjing, H.2
Buzhou, M.3
Tengcai, M.4
-
14
-
-
77957899953
-
-
B. Sera, P. Spatenka, M. Sery, N. Vrchotova, and I. Hruskova, IEEE Trans. Plasma Sci. 38, 2963 (2010).
-
(2010)
IEEE Trans. Plasma Sci.
, vol.38
, pp. 2963
-
-
Sera, B.1
Spatenka, P.2
Sery, M.3
Vrchotova, N.4
Hruskova, I.5
-
15
-
-
84875891754
-
-
Z. Zhou, Y. Huang, S. Yang, and W. Chen, Agric. Sci. 2, 23 (2011).
-
(2011)
Agric. Sci.
, vol.2
, pp. 23
-
-
Zhou, Z.1
Huang, Y.2
Yang, S.3
Chen, W.4
-
16
-
-
84857215857
-
-
S. Kitazaki, K. Koga, M. Shiratani, and N. Hayashi, Jpn. J. Appl. Phys. 51, 01AE01 (2012).
-
(2012)
Jpn. J. Appl. Phys.
, vol.51
, pp. 01AE01
-
-
Kitazaki, S.1
Koga, K.2
Shiratani, M.3
Hayashi, N.4
-
17
-
-
84871363238
-
-
S. Kitazaki, K. Koga, M. Shiratani, and N. Hayashi, Jpn. J. Appl. Phys. 51, 11PJ02 (2012).
-
(2012)
Jpn. J. Appl. Phys.
, vol.51
, pp. 11PJ02
-
-
Kitazaki, S.1
Koga, K.2
Shiratani, M.3
Hayashi, N.4
-
18
-
-
80052016118
-
-
N. Hayashi, A. Nakahigashi, M. Goto, S. Kitazaki, K. Koga, and M. Shiratani, Jpn. J. Appl. Phys. 50, 08JF04 (2011).
-
(2011)
Jpn. J. Appl. Phys.
, vol.50
, pp. 08JF04
-
-
Hayashi, N.1
Nakahigashi, A.2
Goto, M.3
Kitazaki, S.4
Koga, K.5
Shiratani, M.6
-
21
-
-
77956361772
-
-
[in Japanese]
-
H. Einaga, E. Yoshihara, Y. Matsuo, and J. Yodoi, Seibutsu Shiryo Bunseki 32, 265 (2009) [in Japanese].
-
(2009)
Seibutsu Shiryo Bunseki
, vol.32
, pp. 265
-
-
Einaga, H.1
Yoshihara, E.2
Matsuo, Y.3
Yodoi, J.4
-
22
-
-
84930591351
-
-
[in Japanese]
-
K. Ogawa, Kagaku To Seibutsu 40, 752 (2002) [in Japanese].
-
(2002)
Kagaku To Seibutsu
, vol.40
, pp. 752
-
-
Ogawa, K.1
-
23
-
-
84930579464
-
-
[in Japanese]
-
H. Kimura, K. Naganuma, M. Kojima, M. Komatsu, T. Onda, and M. Tsuji, Yamanashi-ken Kogyo Gijutsu Center Kenkyu Hokokusho 22, 59 (2008) [in Japanese].
-
(2008)
Yamanashi-ken Kogyo Gijutsu Center Kenkyu Hokokusho
, vol.22
, pp. 59
-
-
Kimura, H.1
Naganuma, K.2
Kojima, M.3
Komatsu, M.4
Onda, T.5
Tsuji, M.6
|