Redox characteristics of thiol compounds using radicals produced by water vapor radio frequency discharge

Japanese Journal of Applied Physics

Volumn 50, Issue 8 PART 2, 2011, Pages

  Hayashi, Nobuya ^a   Nakahigashi, Akari ^a   Goto, Masaaki ^b   Kitazaki, Satoshi ^c   Koga, Kazunori ^c   Shiratani, Masaharu ^c  

^a SAGA UNIVERSITY   (Japan)

^b SAGA UNIVERSITY   (Japan)

^c KYUSHU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CYSTEINS; OH RADICAL; PLANT CELLS; PLANT GROWTH; RADICAL REACTIONS; RADIO FREQUENCY DISCHARGES; THIOL COMPOUNDS; WATER VAPOR PLASMA;

ELECTRIC DISCHARGES; FREE RADICALS; REACTION KINETICS; REDOX REACTIONS;

WATER VAPOR;

EID: 80052016118     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.50.08JF04     Document Type: Conference Paper

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