Photosensitive functionalized surface-modified quantum dots for polymeric structures via two-photon-initiated polymerization technique

Macromolecular Rapid Communications

Volumn 36, Issue 11, 2015, Pages 1108-1114

  Krini, Redouane ^a   Ha, Cheol Woo ^b   Prabhakaran, Prem ^c   Mard, Hicham El ^a   Yang, Dong Yol ^b   Zentel, Rudolf ^a   Lee, Kwang Sup ^c  

^a JOHANNES GUTENBERG UNIVERSITY   (Germany)

^b Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^c Hannam University   (South Korea)

Author keywords

3D patterned network structures; quantum dots; silica encapsulating; two photon initiated polymerization

Indexed keywords

CROSSLINKING; LUMINESCENCE; NANOCRYSTALS; PHOTONS; PHOTORESISTS; POLYETHYLENE OXIDES; POLYMERIZATION; SHELLS (STRUCTURES); SILICA; TWO PHOTON PROCESSES;

CROSS-LINKED POLYMERS; FUNCTIONALIZED SILICA; FUNCTIONALIZED SURFACES; MINIEMULSION PROCESS; NETWORK STRUCTURES; POLYMERIC STRUCTURES; POLYMERIZABLE GROUPS; TWO-PHOTON INITIATED POLYMERIZATION;

SEMICONDUCTOR QUANTUM DOTS;

POLYMER; QUANTUM DOT; SILICON DIOXIDE;

CHEMISTRY; INFRARED SPECTROSCOPY; PHOTON; POLYMERIZATION; SURFACE PROPERTY; SYNTHESIS; ULTRASTRUCTURE;

PHOTONS; POLYMERIZATION; POLYMERS; QUANTUM DOTS; SILICON DIOXIDE; SPECTROSCOPY, FOURIER TRANSFORM INFRARED; SURFACE PROPERTIES;

EID: 84930382217     PISSN: 10221336     EISSN: 15213927     Source Type: Journal    
DOI: 10.1002/marc.201500045     Document Type: Article

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