Orientation contrast of secondary electron images from electropolished metals

Ultramicroscopy

Volumn 156, Issue , 2015, Pages 41-49

  Chen, D ^a   Chang, C P ^a   Loretto, M H ^b  

^a NATIONAL SUN YAT SEN UNIVERSITY   (Taiwan)

^b UNIVERSITY OF BIRMINGHAM   (United Kingdom)

Author keywords

Electropolishing; Metals; Orientation contrast; SEM

Indexed keywords

ELECTROLYTIC POLISHING; METALS; SCANNING ELECTRON MICROSCOPY;

APPLICATION EXAMPLES; ELECTROPOLISHED; IMAGING CONDITIONS; IMAGING METHOD; SECONDARY ELECTRON DETECTORS; SECONDARY ELECTRON IMAGES;

SECONDARY EMISSION;

METAL;

ANALYTICAL PARAMETERS; ARTICLE; ELECTRON; ORIENTATION CONTRAST; SCANNING ELECTRON MICROSCOPE; SCANNING ELECTRON MICROSCOPY; SECONDARY ELECTRON IMAGE; SURFACE PROPERTY;

EID: 84929307850     PISSN: 03043991     EISSN: 18792723     Source Type: Journal    
DOI: 10.1016/j.ultramic.2015.05.005     Document Type: Article

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