Amine-terminated monolayers on carbon: Preparation, characterization, and coupling reactions

Langmuir

Volumn 31, Issue 18, 2015, Pages 5071-5077

  Lee, Lita ^a   Leroux, Yann R ^b   Hapiot, Philippe ^b   Downard, Alison J ^a  

^a UNIVERSITY OF CANTERBURY   (New Zealand)

^b UNIVERSITÉ DE RENNES 1   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ATOMIC FORCE MICROSCOPY; CARBON; DEPTH PROFILING; GLASSY CARBON; MULTILAYER FILMS; PHOTORESISTS;

CARBOXYLIC ACID DERIVATIVES; COUPLING REACTION; DFT CALCULATION; ELECTRO ACTIVES; ELECTROCHEMICAL MEASUREMENTS; FERROCENYL GROUPS; PYROLYZED PHOTORESIST FILMS; SURFACE CONCENTRATION;

MONOLAYERS;

EID: 84929206908     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/acs.langmuir.5b00730     Document Type: Article

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