Efficient covalent modification of a carbon surface: Use of a silyl protecting group to form an active monolayer

Journal of the American Chemical Society

Volumn 132, Issue 40, 2010, Pages 14039-14041

  Leroux, Yann R ^b   Fei, Hui ^b   Noël, Jean Marc ^b   Roux, Clément ^b   Hapiot, Philippe ^a  

^a UNIVERSITÉ DE RENNES 1   (France)

^b NONE

Author keywords

[No Author keywords available]

Indexed keywords

A-CARBON; ARYLDIAZONIUM SALTS; CARBON SUBSTRATES; CONTROLLED MORPHOLOGY; COVALENT MODIFICATIONS; DEPROTECTION; ELECTRO REDUCTION; ELECTROGRAFTING; ETHYNYL; FERROCENYL GROUPS; FUNCTIONALIZATIONS; GLOBAL STRATEGIES; HIGH SELECTIVITY; MODIFIED SURFACES; PROTECTING GROUP; REDOX ACTIVITY; STERIC HINDRANCES; SURFACE CONCENTRATION;

CHARGE TRANSFER; ELECTROLYTIC REDUCTION; FUNCTIONAL GROUPS; ION EXCHANGE; REDOX REACTIONS;

MONOLAYERS;

AZIDOMETHYLFERROCENE; CARBON; DIAZONIUM COMPOUND; FERROCENE DERIVATIVE; SILANE DERIVATIVE; TRIISOPROPYLSILYL DERIVATIVE; UNCLASSIFIED DRUG;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMICAL MODIFICATION; COVALENT BOND; CYCLIC POTENTIOMETRY; DEPROTECTION REACTION; OXIDATION REDUCTION REACTION; SURFACE PROPERTY; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 77957722830     PISSN: 00027863     EISSN: 15205126     Source Type: Journal    
DOI: 10.1021/ja106971x     Document Type: Article

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