The crucial role of confined residual additives on the photostability of P3HT:PCBM active layers

Journal of Physical Chemistry C

Volumn 119, Issue 17, 2015, Pages 9142-9148

  Tournebize, Aurélien ^a,b   Rivaton, Agnès ^b,c   Peisert, Heiko ^a   Chassé, Thomas ^a  

^a UNIVERSITY OF TÜBINGEN   (Germany)

^b UNIVERSITÉ CLERMONT AUVERGNE   (France)

^c ICCF   (France)

Author keywords

[No Author keywords available]

Indexed keywords

IRRADIATION; MOLECULES; PHOTOOXIDATION;

COMBINED ACTIONS; CONJUGATED BACKBONES; INDUSTRIAL-SCALE PRODUCTION; LIGHT IRRADIATIONS; LIGHT SOAKING; OCTANEDITHIOL; PHOTO-STABILITY; STATE OF THE ART;

CONJUGATED POLYMERS;

EID: 84928794380     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/acs.jpcc.5b01733     Document Type: Article

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