Focused-ion-beam-induced insulator deposition at decreased beam current density

Annual Proceedings - Reliability Physics (Symposium)

Volumn , Issue , 1997, Pages 66-71

  Abramo, Marsha ^a   Adams, Edward ^a   Gibson, Margaret ^a   Hahn, Loren ^a   Doyle, Andrew ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT DENSITY; DEPOSITION; ION BEAMS; LEAKAGE CURRENTS; SILICA;

FOCUSED ION BEAM SYSTEM;

SEMICONDUCTING FILMS;

EID: 0030654686     PISSN: 00999512     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)