Photolithographic patterning of cellulose: a versatile dual-tone photoresist for advanced applications

Cellulose

Volumn 22, Issue 1, 2015, Pages 717-727

  Wolfberger, Archim ^a   Petritz, Andreas ^b   Fian, Alexander ^b   Herka, Jakob ^a   Schmidt, Volker ^b   Stadlober, Barbara ^b   Kargl, Rupert ^c   Spirk, Stefan ^d   Griesser, Thomas ^a  

^a UNIVERSITY OF LEOBEN   (Austria)

^b JOANNEUM RESEARCH   (Austria)

^c UNIVERSITY OF MARIBOR   (Slovenia)

^d GRAZ UNIVERSITY OF TECHNOLOGY   (Austria)

Author keywords

Cellulose; Lithography; Organic electronics; Organic thin film transistor; Photochemistry; Photoresist

Indexed keywords

CELLULOSE; CELLULOSE FILMS; CHEMICAL SENSORS; FIELD EFFECT TRANSISTORS; LITHOGRAPHY; PHOTOCHEMICAL REACTIONS; PHOTORESISTS; THIN FILM CIRCUITS; THIN FILM TRANSISTORS; TWO PHOTON PROCESSES;

ELECTRICAL INTERCONNECTS; ORGANIC ELECTRONICS; ORGANIC THIN FILM TRANSISTORS; PATTERNING TECHNIQUES; PHOTOLITHOGRAPHIC PATTERNING; SCIENCE AND TECHNOLOGY; TRIMETHYLSILYL CELLULOSE; TWO PHOTON ABSORPTION;

THIN FILMS;

EID: 84925490282     PISSN: 09690239     EISSN: 1572882X     Source Type: Journal    
DOI: 10.1007/s10570-014-0471-4     Document Type: Article

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