Characteristics of DC gas-liquid phase atmospheric-pressure plasma and bacteria inactivation mechanism

Plasma Processes and Polymers

Volumn 12, Issue 3, 2015, Pages 252-259

  Shen, Jie ^a,b   Sun, Qiang ^c   Zhang, Zelong ^c   Cheng, Cheng ^a   Lan, Yan ^a   Zhang, Hao ^c   Xu, Zimu ^a   Zhao, Ying ^a   Xia, Weidong ^c   Chu, Paul K ^d  

^a INSTITUTE OF PLASMA PHYSICS   (China)

^b HEFEI INSTITUTES OF PHYSICAL SCIENCE   (China)

^c UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

^d CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

bacteria inactivation; gas liquid phase atmospheric pressure plasma; plasma process in liquid; reactive species

Indexed keywords

ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; BACTERIA; BODY FLUIDS; GASES; LIQUIDS; MEDICAL APPLICATIONS; OPTICAL EMISSION SPECTROSCOPY; PH EFFECTS; PURIFICATION; WATER TREATMENT; WATER TREATMENT PLANTS;

ATMOSPHERIC PRESSURE COLD PLASMAS; ATMOSPHERIC PRESSURE PLASMAS; BACTERIA INACTIVATION; ELECTRON EXCITATION TEMPERATURE; INACTIVATION OF MICROORGANISMS; OPTICAL EMISSION SPECTROSCOPIES (OES); PLASMA PROCESS; REACTIVE SPECIES;

PLASMA DIAGNOSTICS;

EID: 84925441966     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.201400129     Document Type: Article

References (56)

1. K. Kim, G. Y. Kim, Y. C. Hong, S. S. Yang, Microelectron. Eng. 2010, 87, 1177.
2. Y. C. Honga, H. S. Uhm, Appl. Phys. Lett. 2006, 89, 2215.
3. D. Mariotti, Appl. Phys. Lett. 2008, 92, 151505.
4. P. K. Chu, IEEE Trans. Plasma Sci. 2007, 35, 181.
5. C. Cheng, L. Y. Zhang, R. J. Zhan, Surf. Coat. Technol. 2006, 200, 665.
6. I. Levchenko, K. Ostrikov, E. Tam, Appl. Phys. Lett. 2006, 89, 223108.
7. D. Z. Xiao, C. Cheng, J. Shen, Y. Lan, H. B. Xie, X. S. Shu, Y. D. Meng, J. G. Li, P. K. Chu, Phys. Plasmas. 2014, 21, 053510.
8. S. Q. Wu, Z. Wang, Q. J. Huang, X. P. Lu, Y. Pan, IEEE Trans. Plasma Sci. 2011, 39, 1489.
9. Y. J. Zhou, Q. H. Yuan, F. Li, X. M. Wang, G. Q. Yin, C. Z. Dong, Phys. Plasmas. 2013, 20, 113502.
10. D. Z. Xiao, C. Cheng, J. Shen, Y. Lan, H. B. Xie, X. S. Shu, Y. D. Meng, J. G. Li, P. K. Chu, J. Appl. Phys. 2014, 115, 033303.
11. T. Homma, M. Furuta, Y. Takemura, Jpn. J. Appl. Phys. 2013, 52, 036201.
12. X. P. Lu, G. V. Naidisb, M. Laroussic, K. Ostrikovd, Phys. Rep. 2014, 540, 123.
13. S. Iseki, H. Hashizume, F. Jia, K. Takeda, K. Ishikawa, T. Ohta, M. Ito, M. Hori, Appl. Phys. Express. 2011, 4, 1162013.
14. J. Shen, C. Cheng, S. D. Fang, H. B. Xie, Y. Lan, G. H. Ni, Y. D. Meng, J. R. Luo, X. K. Wang, Appl. Phys. Express. 2012, 5, 036201.
15. H. Hashizume, T. Ohta, J. Fengdong, K. Takeda, K. Ishikawa, M. Hori, M. Ito, Appl. Phy. Lett. 2013, 103, 153708.
16. Z. Machala, B. Tarabova, K. Hensel, E. Spetlikova, L. Sikurova, P. Lukes, Plasma Process. Polym. 2013, 10, 649.
17. S. Ikawa, K. Kitano, S. Hamaguchi, Plasma Process. Polym. 2010, 7, 33.
18. P. Jamroz, K. Greda, P. Pohl, Plasma Process. Polym. 2014, 10.1002/201400012
19. K. P. Arjunan, A. M. Clyne, Plasma Process. Polym. 2011, 8, 1154.
20. D. Z. Yang, L. Jia, W. C. Wang, S. W. Wang, S. Wang, P. C. Jiang, S. Z. Zhang, Q. X. Yu, G. L. Chen, Plasma Process. Polym. 2014, 10.1002/201300193
21. R. N. Ma, H. Q. Feng, J. S. Guo, Y. D. Liang, Q. Zhang, Y. Tian, J. Zhang, J. Fang, Plasma Process. Polym. 2014, 10.1002/201300206
22. M. G. Kong, G. Kroesen, G. Morfill, T. Nosenko, T. Shimizu, J. V. Dijk, J. L. Zimmermann, New J. Phys. 2009, 11, 115012.
23. C. V. Gils, S. Hofmann, B. Boekema, R. Brandenburg, P. J. Bruggeman, J. Phys. D: Appl. Phys. 2013, 46, 175203.
24. P. Lukes, E. Dolezalova, I. Sisrova, M. Clupek, Plasma Sources Sci, Technol. 2014, 23, 015019.
25. M. J. Traylor, M. J. Pavlovich, S. Karim, P. Hait, Y. Sakiyama, D. S. Clark, D. B. Graves, J. Phys. D: Appl. Phys. 2011, 44, 472001.
26. P. Lukes, B. R. Locke, J. L. Brisset, "Aqueous-phase chemistry of electrical discharge plasma in water and in gas-liquid environments," in Plasma Chemistry and Catalysis in Gases and Liquids, V. I. Parvulescu, M. Magureanu, P. Lukes, Eds., Wiley-VCH, Weinheim, Germany 2012, Ch. 7, p. 241.
27. P. Lukes, J. L. Brisset, B. R. Locke, "Biological effects of electrical discharge plasma in water and in gas-liquid environments," in Plasma Chemistry and Catalysis in Gases and Liquids, V. I. Parvulescu, M. Magureanu, P. Lukes, Eds., Wiley-VCH, Weinheim, Germany 2012, Ch. 8, p. 309.
28. P. Bruggeman, F. Iza, P. Guns, D. Lauwers, M. G. Kong, Y. A. Gonzalvo, C. Leys, D. C. Schram, Plasma Sources Sci, Technol. 2010, 19, 015016.
29. P. Bruggeman, D. Schram, M. A. Gonzalez, R. Rego, M. G. Kong, C. Leys, Plasma Sources Sci, Technol. 2009, 18, 025017.
30. P. Bruggeman, C. Leys, J. Phys. D: Appl. Phys. 2009, 42, 053001.
31. http://www.wtw.de.
32. A. Sarani, A. Y. Nikiforov, C. Leys, Phys. Plasmas. 2010, 17, 063504.
33. J. Luque, D. R. Crosley, LIFBASE: database and spectral simulation (version 1.5), SRI International Report M. 1999, P 99-P009.
34. P. Bruggeman, T. Verreycken, M. A. Gonzalez, J. L. Walsh, M. G. Kong, C. Leys, D. C. Schram, J. Phys. D: Appl. Phys. 2010, 43, 124005.
35. P. Bruggeman, J. Liu, J. Degroote, M. G. Kong, J. Vierendeels, C. Leys, J. Phys. D: Appl. Phys. 2008, 41, 215201.
36. Y. Lu, S. F. Xu, X. X. Zhong, K. Ostrikov, U. Cvelbar, D. Mariotti, Europhys. Lett. 2013, 102, 15002.
37. S. Forster, C. Mohr, W. Viol, Surf. Coat. Technol. 2005, 200, 827.
38. M. Y. Qian, C. S. Ren, D. Z. Wang, J. L. Zhang, G. D. Wei, J. Appl. Phys. 2010, 107, 063303.
39. J. L. Walsh, M. G. Kong, Appl. Phys. Lett. 2008, 93, 111501.
40. J. Torres, J. M. Palomares, A. Sola, J. J. A. M. van der Mullen, J. Gamero, J. Phys. D: Appl. Phys. 2007, 40, 5929.
41. M. Laroussi, Plasma Process. Polym. 2005, 2, 391.
42. X. Y. Zhang, D. P. Liu, H. Z. Wang, L. Y. Liu, S. B. Wang, S. Z. Yang, Plasma Chem Plasma Process. 2012, 32, 949.
43. A. Y. Nikiforov, A. Sarani, C. Leys, Plasma Sources Sci, Technol. 2011, 20, 015014.
44. N. Bai, P. Sun, H. X. Zhou, H. Y. Wu, R. X. Wang, F. X. Liu, W. D. Zhu, J. L. Lopez, J. Zhang, J. Fang, Plasma Process. Polym. 2011, 8, 424.
45. B. Sun, M. Sato, J. S. Clements, J. Electrostat. 1997, 39, 189.
46. C. I. M. Beenakker, F. J. De Heer, H. B. Krop, G. R. Mohlmann, Chem. Phys. 1974, 6, 445.
47. M. Laroussi, F. Leipold, Int. J. Mass Spectrom. 2004, 233, 81.
48. I. Fridovitch, Annu. Rev. Biochem. 1995, 64, 97.
49. W. H. Glaze, J. W. Kang, D. H. Chapin, Ozone: Sci. Eng. 1987, 9, 335.
50. C. M. Du, Y. W. Sun, X. F. Zhuang, Plasma Chem. Plasma Proc. 2008, 28, 523.
51. W. J. Bian, M. H. Zhou, L. C. Lei, Plasma Chem. Plasma Proc. 2007, 27, 337.
52. S. Wu, Z. Wang, Q. Huang, X. Tan, X. Lu, K. Ostrikov, Phys. Plasmas. 2013, 20, 023503.
53. M. Moravej, X. Yang, M. Barankin, J. Penelon, S. E. Babayan, R. F. Hicks, Plasma Sources Sci, Technol. 2006, 15, 204.
54. C. W. Chen, H. M. Lee, M. B. Chang, J. Electrostat. 2009, 67, 703.
55. M. Naïtali, G. K. Youbi, J. M. Herry, M. N. Bellon-Fontaine, J. L. Brisset, Appl. Environ. Microb. 2010, 76, 7662.
56. K. Oehmigen, M. Hahnel, R. Brandenburg, C. Wilke, K. D. Weltmann, T. V. Woedtke, Plasma Process. Polym. 2010, 7, 250.