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Volumn 31, Issue 10, 2015, Pages 3242-3253

A Photolithographic Approach to Spatially Resolved Cross-Linked Nanolayers

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; ATOMIC FORCE MICROSCOPY; CRYSTAL ATOMIC STRUCTURE; ELECTRODEPOSITION; ELECTROSPRAY IONIZATION; FREE RADICAL POLYMERIZATION; FREE RADICALS; MASS SPECTROMETRY; NANOSHEETS; ORGANIC POLYMERS; PHOTOCHEMICAL REACTIONS; PHOTOIONIZATION; SECONDARY ION MASS SPECTROMETRY; SELF ASSEMBLED MONOLAYERS; SILICON; SILICON WAFERS; SPECTROMETRY; SURFACE TREATMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 84925002890     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la505011j     Document Type: Article
Times cited : (4)

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