Stable and efficient multi-crystalline n+p silicon photocathode for H2 production with pyramid-like surface nanostructure and thin Al2O3 protective layer

Applied Physics Letters

Volumn 106, Issue 1, 2015, Pages

  Fan, Ronglei ^a   Dong, Wen ^a   Fang, Liang ^a   Zheng, Fengang ^a   Su, Xiaodong ^a   Zou, Shuai ^a   Huang, Jie ^a   Wang, Xusheng ^a   Shen, Mingrong ^a  

^a SOOCHOW UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COATINGS; CRYSTALLINE MATERIALS; ELECTROCHEMISTRY; ELECTROMAGNETIC WAVE ABSORPTION; LIGHT ABSORPTION; LIGHT REFLECTION; NANOSTRUCTURES; PHOTOCATHODES; PHOTOELECTROCHEMICAL CELLS; SILICON; SILICON WAFERS;

ELECTRODE SURFACES; ENHANCED LIGHT ABSORPTIONS; METAL CATALYZED CHEMICAL ETCHINGS; MINORITY CARRIER; PHOTOELECTROCHEMICALS; PROTECTIVE LAYERS; SURFACE NANOSTRUCTURE; SURFACE RECOMBINATIONS;

ALUMINUM;

EID: 84923771763     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4905511     Document Type: Article

References (20)

1. M. G. Walter, E. L. Warren, J. R. McKone, S. W. Boettcher, Q. X. Mi, E. A. Santori, and N. S. Lewis, Chem. Rev. 110, 6446 (2010). 10.1021/cr1002326
2. X. B. Chen, S. H. Shen, L. J. Guo, and S. S. Mao, Chem. Rev. 110, 6503 (2010). 10.1021/cr1001645
3. R. N. Dominey, N. S. Lewis, J. A. Bruce, D. C. Bookbinder, and M. S. Wrighton, J. Am. Chem. Soc. 104, 467 (1982). 10.1021/ja00366a016
4. J. Oh, T. G. Deutsch, H. C. Yuan, and H. M. Branz, Energy Environ. Sci. 4, 1690 (2011). 10.1039/c1ee01124c
5. J. Y. Jung, M. J. Choi, K. Zhou, X. Li, S. W. Jee, H. D. Um, M. J. Park, K. T. Park, J. H. Bang, and J. H. Lee, J. Mater. Chem. A 2, 833 (2014). 10.1039/c3ta14439a
6. I. Oh, J. Kye, and S. Hwang, Nano Lett. 12, 298 (2012). 10.1021/nl203564s
7. P. Dai, J. Xie, M. T. Mayer, X. Yang, J. Zhan, and D. Wang, Angew. Chem. Int. Ed. 125, 11325 (2013). 10.1002/ange.201303813
8. U. Sim, H. Y. Jeong, T. Y. Yang, and K. T. Nam, J. Mater. Chem. A 1, 5414 (2013). 10.1039/c3ta00048f
9. X. Ao, X. Tong, D. S. Kim, L. Zhang, M. Knez, F. Müller, S. He, and V. Schmidt, Appl. Phys. Lett. 101, 111901 (2012). 10.1063/1.4752231
10. H. Gerischer, Faraday Discuss. Chem. Soc. 70, 137 (1980). 10.1039/dc9807000137
11. M. J. Kenney, M. Gong, Y. Li, J. Z. Wu, J. Feng, M. Lanza, and H. Dai, Science 342, 836 (2013). 10.1126/science.1241327
12. S. W. Boettcher, E. L. Warren, M. C. Putnam, E. A. Santori, D. T. Evans, M. D. Kelzenberg, M. G. Walter, J. R. McKone, B. S. Brunschwig, H. A. Atwater, and N. S. Lewis, J. Am. Chem. Soc. 133, 1216 (2011). 10.1021/ja108801m
13. B. Seger, T. Pedersen, A. B. Laursen, P. C. K. Vesborg, O. Hansen, and I. Chorkendorff, J. Am. Chem. Soc. 135, 1057 (2013). 10.1021/ja309523t
14. B. Seger, A. B. Laursen, P. C. K. Vesborg, T. Pedersen, O. Hansen, S. Dahl, and I. Chorkendorf, Angew. Chem. Int. Ed. 51, 9128 (2012). 10.1002/anie.201203585
15. M. J. Choi, J. Y. Jung, M. J. Park, J. W. Song, J. H. Lee, and J. H. Bang, J. Mater. Chem. A 2, 2928 (2014). 10.1039/c3ta14443g
16. P. Panek, M. Lipinski, and J. Dutkiewicz, J. Mater. Sci. 40, 1459 (2005). 10.1007/s10853-005-0583-1
17. F. Toor, H. M. Branz, M. R. Page, K. M. Jones, and H. C. Yuan, Appl. Phys. Lett. 99, 103501 (2011). 10.1063/1.3636105
18. X. Y. Ye, S. Zou, K. X. Chen, J. J. Li, J. Huang, F. Cao, X. S. Wang, L. J. Zhang, X. F. Wang, M. R. Shen, and X. D. Su, Adv. Funct. Mater. 24, 6708 (2014). 10.1002/adfm.201401589
19. +p photocathde.
20. B. Hoex, S. B. S. Heil, E. Langereis, M. C. M. Van de Sanden, and W. M. M. Kessels, Appl. Phys. Lett. 89, 042112 (2006). 10.1063/1.2240736