Surface and texture properties of mesoporous silica materials modified by silicon-organic compounds containing quaternary amino groups for their application in base-catalyzed reactions

Microporous and Mesoporous Materials

Volumn 203, Issue C, 2015, Pages 224-231

  Borodina, E ^a   Karpov, S I ^a   Selemenev, V F ^a   Schwieger, W ^b   Maracke, S ^c   Froba M ^c   Rossner F ^a  

^a VORONEZH STATE UNIVERSITY   (Russian Federation)

^b UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

^c UNIVERSITY OF HAMBURG   (Germany)

Author keywords

Knoevenagel condensation; Mesoporous silica materials; Quaternary ammonium groups; Surface modification

Indexed keywords

CHLORINE COMPOUNDS; GRAFTING (CHEMICAL); ORGANIC SOLVENTS; SILICA; SILICON COMPOUNDS; SURFACE TREATMENT; THERMOGRAVIMETRIC ANALYSIS; X RAY DIFFRACTION;

ADSORPTION/DESORPTION; BASE-CATALYZED REACTION; DIFFUSE REFLECTANCE INFRARED FOURIER TRANSFORM SPECTROSCOPIES; HOMOGENEOUS DISTRIBUTION; KNOEVENAGEL CONDENSATION; MESOPOROUS SILICA MATERIALS; ORGANIC-INORGANIC COMPOSITE; QUATERNARY AMMONIUM GROUP;

MESOPOROUS MATERIALS;

EID: 84922860227     PISSN: 13871811     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.micromeso.2014.10.009     Document Type: Article

References (56)

1. T. Yanagisawa, T. Shimizu, K. Kuroda, and C. Kato Bull. Chem. Soc. Jpn. 63 1990 988
2. S. Inagaki, Y. Fukushima, and K. Kuroda J. Chem. Soc., Chem. Commun. 8 1993 680
3. J.S. Beck, J.C. Vartuli, W.J. Roth, M.E. Leonowicz, T. Kresge, K.D. Schmitt, C.T.W. Chu, D.H. Olson, E.W. Sheppard, S.B. McCullen, J.B. Higgins, and J.L. Schlenkert J. Am. Chem. Soc. 114 1992 10834
4. G.E. Fryxell, S.V. Mattigod, Y. Lin, H. Wu, S. Fiskum, K. Parker, F. Zheng, W. Yantasee, T.S. Zemanian, R.S. Addleman, J. Liu, K. Kemner, S. Kelly, and X. Feng J. Mater. Chem. 17 2007 2863
5. R. Saad, S. Hamoudi, and K. Belkacemi J. Porous Mater. 15 2008 315
6. Q.H. Xia, K. Hidajat, and S. Kawi Stud. Surf. Sci. Catal. 154 2004 453
7. M. Grün, A.A. Kurganov, S. Schacht, F. Schüth, and K.K. Unger J. Chromatogr. A 740 1996 1
8. T. Martin, A. Galarneau, F. Di Renzo, D. Brunel, and F. Fajula Chem. Mater. 16 2004 1725
9. D. Fattakhova-Rohlfing, J. Rathouský, Y. Rohlfing, O. Bartels, and M. Wark Langmuir 21 2005 11320
10. P. Tien, L.-K. Chau, Y.-Y. Shieh, W.-C. Lin, and G.-T. Wei Chem. Mater. 13 2001 1124
11. A. Walcarius, N. Luethi, J.-L. Blin, B.-L. Su, and L. Lamberts Electrochim. Acta 44 1999 4601
12. M.H. Lim, and A. Stein Chem. Mater. 11 1999 3285
13. A. Matsumoto, K. Tsutsumi, K. Schumacher, and K.K. Unger Langmuir 18 2002 4014
14. P.J.E. Harlick, and A. Sayari Stud. Surf. Sci. Catal. 158 2005 987
15. V. Antochshuk, A.S. Araujo, and M. Jaroniec J. Phys. Chem. B 104 2000 9713
16. J. Wei, J. Shi, H. Pan, Q. Su, J. Zhu, and Y. Shi Microporous Mesoporous Mater. 117 2009 596
17. M. Luechinger, R. Prins, and G.D. Pirngruber Microporous Mesoporous Mater. 85 2005 111
18. H.Y. Huang, R.T. Yang, D. Chinn, and C.L. Munson Ind. Eng. Chem. Res. 42 2003 2427
19. T. Yokoi, H. Yoshitake, and T. Tatsumi J. Mater. Chem. 14 2004 951
20. M.A. Markowitz, G. Deng, M.C. Burleigh, E.M. Wong, and B.P. Gaber Langmuir 17 2001 7085
21. S. Sadasivan, D. Khushalani, and S. Mann J. Mater. Chem. 13 2003 1023
22. B. Lee, L.-L. Bao, H.-J. Im, S. Dai, E.W. Hagaman, and J.S. Lin Langmuir 19 2003 4246
23. F. Hoffmann, M. Cornelius, J. Morell, and M. Fröba Angew. Chem. Int. Ed. 45 2006 3216
24. K.Y. Ho, G. McKay, and K.L. Yeung Langmuir 19 2003 3019
25. H. Salmio, and D. Brühwiler J. Phys. Chem. C 111 2007 923
26. N. Gartmann, and D. Brühwiler Angew. Chem. Int. Ed. 48 2009 6354
27. A. Walcarius, M. Etienne, S. Sayen, and B. Lebeau Electroanalysis 15 2003 414
28. P. Trens, and R. Denoyel Langmuir 12 1996 2781
29. V. Ganesan, and A. Walcarius Mater. Sci. Eng. B 149 2008 123
30. A. Cauvel, G. Renard, and D. Brunel J. Org. Chem. 62 1997 749
31. K.K. Sharma, and T. Asefa Angew. Chem. Int. Ed. 46 2007 2879
32. J.C. Hicks, and C.W. Jones Langmuir 22 2006 2676
33. M. Etiennne, and A. Walcarius Talanta 59 2003 1173
34. Z. Zhou, A.W. Franz, M. Hartmann, A. Seifert, T.J.J. Müller, and W.R. Thiel Chem. Mater. 20 2008 4986
35. D. Fattakhova-Rohlfing, M. Wark, and J. Rathousky Chem. Mater. 19 2007 1640
36. H. Ritter, and D. Brühwiler J. Phys. Chem. C 113 2009 10667
37. K.K. Sharma, A. Anan, R.P. Buckley, W. Ouellette, and T. Asefa J. Am. Chem. Soc. 130 2008 218
38. S. Brunauer, P.H. Emmett, and E. Teller J. Am. Chem. Soc. 60 1938 309
39. A. Patel, and N. Narkhede Catal. Sci. Technol. 3 2013 3317
40. N. Gartmann, C. Schütze, H. Ritter, and D. Brühwiler J. Phys. Chem. Lett. 1 2010 379
41. Z. Zhou, Q. Meng, A. Seifert, Y. Sun, and W.R. Thiel Microporous Mesoporous Mater. 121 2009 145
42. D. Brühwiler Nanoscale 2 2010 887
43. X. Feng, G.E. Fryxell, L.Q. Wang, A.Y. Kim, J. Liu, and K.M. Kemner Science 276 1997 923
44. J. Liu, X. Feng, G.E. Fryxell, L.-Q. Wang, A.Y. Kim, and M. Gong Adv. Mater. 10 1998 161
45. X.S. Zhao, G.Q. Lu, A.K. Whittaker, G.J. Millar, and H.Y. Zhu J. Phys. Chem. B 101 1997 6525
46. D.W. Sindorf, and G.E. Macie J. Am. Chem. Soc. 105 1983 1487
47. S.V. Sirotin, I.F. Moskovskaya, Yu.G. Kolyagin, A.V. Yatsenko, and B.V. Romanovsky Rus. J. Phys. Chem. A 85 2011 390
48. J. Chen, Q. Li, R. Xu, and F. Xiao Angew. Chem. Int. Ed. 107 1995 2898
49. D. Koodyanska, J. Riczkowski, and Z. Hubicki Eur. Phys. J. Spec. Top. 154 2008 339
50. S. Miyayama, K. Nishijima, T. Kamai, T. Chiyoya, T. Tsubota, and T. Ohno Sep. Purif. Technol. 58 2007 206
51. C.H. Rochester, and G.H. Yong J. Chem. Soc. Faraday Trans. 76 1980 1158
52. A. Piers, and C.H. Rochester J. Chem. Soc. Faraday Trans. 91 1995 105
53. G. Srinivasan, A. Kyrlidis, C. McNeff, and K. Müller J. Chromatogr. A 1081 2005 132
54. G. Srinivasan, C. Meyer, N. Welsch, K. Albert, and K. Müller J. Chromatogr. A 1113 2006 45
55. G. Srinivasan, L.C. Sander, and K. Müller Anal. Bioanal. Chem. 384 2006 514
56. D.L. Kotova, and V.F. Selemenev Thermicheskiy analys ionnoobmennikh materialov 2002 Nauka Izdatelstvo M