The combination effect of dielectric barrier discharge (DBD) and TiO2 catalytic process on styrene removal and the analysis of the by-products and intermediates

Research on Chemical Intermediates

Volumn 41, Issue 1, 2015, Pages 175-189

  Zhang, Hongbo ^a   Li, Kan ^a   Sun, Tonghua ^a   Jia, Jingping ^a   Lou, ZiYang ^a   Yao, Shangan ^a   Wang, Guan ^a  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

Author keywords

Dielectric barrier discharge; Styrene; TiO2; VOCs

Indexed keywords

DIELECTRIC MATERIALS; ELECTRIC DISCHARGES; ELECTRIC REACTORS; ELECTRODES; FLOW CONTROL; MINERALOGY; SOL-GEL PROCESS; SOL-GELS; STYRENE; TITANIUM DIOXIDE; TUBES (COMPONENTS);

CATALYTIC EFFICIENCIES; DIELECTRIC BARRIER DISCHARGE REACTORS; DIELECTRIC BARRIER DISCHARGES; HIGH PHOTOCATALYTIC ACTIVITIES; INDUSTRIAL POLLUTANTS; PHOTOCATALYTIC PROCESS; TIO; VOCS;

DIELECTRIC DEVICES;

EID: 84921699726     PISSN: 09226168     EISSN: 15685675     Source Type: Journal    
DOI: 10.1007/s11164-013-1180-6     Document Type: Article

References (31)

1. J.K. Chunga, S.J. Shen, Z.T. Jiang, W. Yuan, J. Zheng, Toxicol. Lett. 210, 353 (2012)
2. C.L. Huang, H.Y. Zhang, Z.Y. Sun, Y.F. Zhao, S. Chen, R.T. Tao, Z.M. Liu, J. Colloid Interface Sci. 364, 298 (2011)
3. W. Yuana, H. Jinb, J.K. Chung, J. Zheng, Chem-Biol. Interact. 186, 323 (2010)
4. T.C. Morata, M. Sliwinska-Kowalska, A.C. Johnson, J. Starck, K. Pawlas, E. Zamyslowska-Szmytke, P. Nylen, E. Toppila, E. Krieg, N. Pawlas, D. Prasher, Int. J. Audiol. 50, 652 (2011)
5. W. Tang, I. Hemm, G. Eisenbrand, Toxicology 144, 39 (2000)
6. R. Babaee, B. Bonakdarpour, B. Nasernejad, N. Fallah, J. Hazard. Mater. 184, 111 (2010)
7. B. Boulinguiez, P. Le Cloirec, Energy Fuels 24, 4756 (2010)
8. F. Adam, A. Lqbal, Chem. Eng. J. 160, 742 (2010)
9. X. Wang, X.Q. Jia, J.P. Wen, Chem. Eng. J. 159, 1 (2010)
10. Y.H. Bai, J.R. Chen, X.Y. Li, C.H. Zhang, Rev. Environ. Contam. Toxicol. 201, 117 (2009)
11. M.B. Chang, S.J. Yu, Environ. Sci. Technol. 35, 1587 (2001)
12. H.M. Lee, M.B. Chang, Plasma Chem. Plasma Process. 23, 541 (2003)
13. J. Chen, J.T. Yang, H. Pan, Q.F. Su, Y.M. Liu, Y. Shi, J. Hazard. Mater. 177, 908 (2010)
14. J. Karuppiah, R. Karvembu, C. Subrahmanyam, Chem. Eng. J. 180, 39 (2012)
15. B. Dhandapani, S.T. Oyama, Appl. Catal. B: Environ. 11, 129 (1997)
16. Y.H. Bai, J.R. Chen, X.Y. Li, C.H. Zhang, Rev. Environ. Contam. Toxicol. (2009). doi:10.1007/978-1-4419-0032-6-4
17. J.Y. Ban, Y.H. Son, M. Kang, S.J. Choung, Appl. Surf. Sci. 253, 535 (2006)
18. H.B. Huang, D.Q. Ye, M.L. Fu, F.D. Feng, Plasma Chem. Plasma Process. 27, 577 (2007)
19. Z.P. Ye, C. Wang, Z.H. Shao, Q. Ye, Y. He, Y. Shi, J. Hazard. Mater. 241, 216 (2012)
20. A. Nasonova, D. Jookim, W. Sikkim, K. Seonkim, Res. Chem. Intermed. 34, 309 (2008)
21. A. Nasonova, H.C. Pham, D.J. Kim, K.S. Kim, Chem. Eng. J. 156, 557 (2010)
22. Ch. Subrahmanyam, A. Renken, L. Kiwi-Minsker, Appl. Catal. B: Environ. 65, 157 (2006)
23. Y.L. Xu, Y. He, X.D. Cao, D.J. Zhong, J.P. Jia, Environ. Sci. Technol. 42, 2612 (2008)
24. B.R. Locke, S.M. Thagard, Plasma Chem. Plasma Process. 32, 875 (2012)
25. H.H. Kim, A. Ogata, S. Futamura, Appl. Catal. B: Environ. 79, 356 (2008)
26. S. Futamura, H. Einaga, H. Kabashima, L.Y. Hwan, Catal. Today 89, 89 (2004)
27. S. Gueerero, I. Guzmán, G. Aguila, B. Chornik, P. Araya, Appl. Catal. B: Environ. 23, 282 (2012)
28. V. Snapkauskienė, V. Valinčius, V. Grigaitienė, Catal. Today 191, 154 (2012)
29. L. Zou, B, Zhu. J. Photochem. Photobiol. A-Chem. 196, 24 (2008)
30. S. Wang, F. Shiraishi, K. Nakanob, Chem. Eng. J. 87, 261 (2002)
31. J. Kitagama, M. Kuzumoto, J. Phys. D Appl. Phys. 32, 3032 (1999)