The effect of Ar/O2 ratio on electrochromic response time of Ni oxides grown using an Rf sputtering system

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 41, Issue 2 B, 2002, Pages

  Ahn, Kwang Soon ^a   Nah, Yoon Chae ^a   Yum, Jun Ho ^a   Sung, Yung Eun ^a  

^a Gwangju Institute of Science and Technology (GIST)   (South Korea)

Author keywords

Electrochromism; Ni oxide; Response time; Sputter; Transmittance

Indexed keywords

ARGON; ELECTRIC CONDUCTIVITY; ELECTROCHROMISM; ELECTROLYTES; IONS; MAGNETRON SPUTTERING; PROTONS;

ELECTROCHROMIC RESPONSE TIME;

NICKEL COMPOUNDS;

EID: 0037085225     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.41.L212     Document Type: Article

References (12)