Atomic oxygen resistance of polyimide/silicon hybrid thin films with different compositions and architectures

High Performance Polymers

Volumn 26, Issue 7, 2014, Pages 712-724

  Lei, Xingfeng ^a   Yao, Pan ^a   Qiao, Mingtao ^a   Sun, Wanlu ^a   Zhang, Hepeng ^a   Zhang, Qiuyu ^a  

^a NORTHWESTERN POLYTECHNICAL UNIVERSITY   (China)

Author keywords

atomic oxygen (AO); hybrid film; Low earth orbit; polyimide; silicon

Indexed keywords

ATOMS; MOLAR RATIO; ORBITS; OXYGEN; PHOTODEGRADATION; POLYIMIDES; SCANNING ELECTRON MICROSCOPY; SILICA; SILICON; SILICON OXIDES; SPACE APPLICATIONS; SPECTROSCOPIC ANALYSIS; TRANSPARENCY;

ATOMIC OXYGEN; HIGH THERMAL STABILITY; HYBRID FILM; LOW EARTH ORBITS; MECHANICAL PERFORMANCE; SPECTROSCOPIC STUDIES; SYNTHESIS AND CHARACTERIZATIONS; X-RAY PHOTOELECTRONS;

THIN FILMS;

EID: 84914162538     PISSN: 09540083     EISSN: 13616412     Source Type: Journal    
DOI: 10.1177/0954008314528011     Document Type: Article

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