Atomic oxygen resistant phosphorus-containing polyimides for LEO environment

Journal of Materials Science

Volumn 47, Issue 12, 2012, Pages 4904-4913

  Xiao, Fei ^a   Wang, Kai ^a   Zhan, Mao Sheng ^a  

^a BEIHANG UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC OXYGEN; DIANHYDRIDES; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; FLUENCES; FOURIER TRANSFORM INFRARED SPECTROMETER; GROUND BASED; INHERENT VISCOSITY; LEO ENVIRONMENT; MASS LOSS; PHOSPHINE OXIDE; POLYIMIDE FILM; X-RAY PHOTOELECTRON SPECTROMETERS;

ATOMS; EROSION; FIELD EMISSION MICROSCOPES; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MAGNETIC FIELDS; OXYGEN; PHOSPHORUS; PHOSPHORUS COMPOUNDS; POLYCONDENSATION; POLYMERIC FILMS; SPECTROMETERS;

POLYIMIDES;

EID: 84862818484     PISSN: 00222461     EISSN: 15734803     Source Type: Journal    
DOI: 10.1007/s10853-012-6363-9     Document Type: Article

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