|
Volumn 87, Issue , 2013, Pages 169-173
|
Characterization of Ni0.92V0.08Ox thin films deposited by the pulse sputter method
|
Author keywords
Electrochromic property; Ni0.92V0.08Ox thin film; Pulse sputtering
|
Indexed keywords
ARGON;
ELECTROCHROMIC DEVICES;
ELECTROCHROMISM;
MICROSTRUCTURE;
NICKEL;
OPTICAL PROPERTIES;
SCANNING ELECTRON MICROSCOPY;
THIN FILMS;
TUNGSTEN COMPOUNDS;
CHEMICAL COMPOSITIONS;
COLORATION EFFICIENCIES;
CRYSTALLINITIES;
ELECTROCHEMICAL ANALYZERS;
ELECTROCHROMIC PROPERTIES;
METALLIC TARGETS;
STOICHIOMETRIC COMPOUND;
X RAY DIFFRACTOMETERS;
X RAY PHOTOELECTRON SPECTROSCOPY;
|
EID: 84911895872
PISSN: 0042207X
EISSN: None
Source Type: Journal
DOI: 10.1016/j.vacuum.2012.03.003 Document Type: Article |
Times cited : (2)
|
References (15)
|