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Volumn 87, Issue , 2013, Pages 169-173

Characterization of Ni0.92V0.08Ox thin films deposited by the pulse sputter method

Author keywords

Electrochromic property; Ni0.92V0.08Ox thin film; Pulse sputtering

Indexed keywords

ARGON; ELECTROCHROMIC DEVICES; ELECTROCHROMISM; MICROSTRUCTURE; NICKEL; OPTICAL PROPERTIES; SCANNING ELECTRON MICROSCOPY; THIN FILMS; TUNGSTEN COMPOUNDS;

EID: 84911895872     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2012.03.003     Document Type: Article
Times cited : (2)

References (15)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.