Electrochromic properties of Ni(V)Ox films deposited via reactive magnetron sputtering with a 8V-92Ni alloy target

Thin Solid Films

Volumn 519, Issue 5, 2010, Pages 1578-1582

  Ye, Jia Ming ^a   Lin, Yu Pin ^a   Yang, Yueh Ting ^a   Chang, Jing Tang ^a   He, Ju Liang ^a  

^a FENG CHIA UNIVERSITY   (Taiwan)

Author keywords

Electrochromic; Reactive magnetron sputter deposition; Smart window; V doped nickel oxide

Indexed keywords

ELECTROCHROMIC PROPERTIES; ELECTROCHROMICS; FERROMAGNETIC PROPERTIES; LARGE-AREA DEPOSITION; MAGNETRON SPUTTER; NI ALLOYS; OPTICAL TRANSMISSIONS; OPTICAL TRANSMITTANCE; OXYGEN FLOW RATIOS; REACTIVE MAGNETRON SPUTTER DEPOSITION; REACTIVE MAGNETRON SPUTTERING; REACTIVE SPUTTER DEPOSITION; RESPONSE TIME; SMART WINDOWS; SPUTTERING EROSION; TARGET SURFACE; V-DOPED NICKEL OXIDE; VISIBLE REGION;

BLEACHING; CERIUM ALLOYS; CLEANING; ELECTROCHROMIC DEVICES; ELECTROCHROMISM; FERROMAGNETIC MATERIALS; FERROMAGNETISM; LIGHT TRANSMISSION; NICKEL OXIDE; OXYGEN; THICK FILMS;

SPUTTER DEPOSITION;

EID: 78649731908     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.08.085     Document Type: Conference Paper

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