The effect of annealing temperature on the electrochromic properties of nanostructured NiO films

Solar Energy Materials and Solar Cells

Volumn 93, Issue 8, 2009, Pages 1195-1201

  Purushothaman, K K ^a   Muralidharan, G ^a  

^a GANDHIGRAM RURAL UNIVERSITY   (India)

Author keywords

Electrochromics; Nanostructures; NiO; Sol gel

Indexed keywords

ANNEALING TEMPERATURES; COLOUR CHANGE; CONDUCTING SUBSTRATES; CONTRAST RATIO; CRYSTALLANITY; DIFFUSION COEFFICIENTS; ELECTROCHROMIC; ELECTROCHROMIC PROPERTIES; ELECTROCHROMICS; FT-IR SPECTRUM; GLASS PLATE; NANO-STRUCTURED; NI-O BOND; NIO; NIO FILMS; OPTIMUM NUMBER; PREPARATION TEMPERATURES; RESPONSE TIME; SEM IMAGE; SOL GEL DIP COATING; TEMPERATURE RANGE; VOLTAMMETRIC;

CRYSTALLITE SIZE; ELECTROCHROMIC DEVICES; ELECTROCHROMISM; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GELATION; GELS; NANOSTRUCTURES; NICKEL; NICKEL OXIDE; OXIDE FILMS; SOL-GEL PROCESS; SOL-GELS; SOLS; THERMAL EFFECTS; X RAY DIFFRACTION;

FILM PREPARATION;

EID: 67349230318     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2008.12.029     Document Type: Article

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