XPS study of cobalt doped TiO2 films prepared by pulsed laser deposition

Surface and Interface Analysis

Volumn 46, Issue 10-11, 2014, Pages 1043-1046

  Gong, Bin ^a   Luo, Xi ^b   Bao, Nina ^c   Ding, Jun ^c   Li, Sean ^b   Yi, Jiabao ^b  

^a UNIVERSITY OF NEW SOUTH WALES   (Australia)

^b UNIVERSITY OF NEW SOUTH WALES   (Australia)

^c NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

Co2+ surface enrichment; Cobalt doped tio2; Ti3+ state; TiO2; XPS

Indexed keywords

ANNEALING; AUGER ELECTRON SPECTROSCOPY; COBALT; COBALT COMPOUNDS; OXIDE MINERALS; PHOTOELECTRON SPECTROSCOPY; PHOTOELECTRONS; PHOTONS; PULSED LASER DEPOSITION; TITANIUM; TITANIUM DIOXIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

AMBIENT CONDITIONS; ANNEALED SAMPLES; AUGER-ELECTRON SPECTRA; IN-SITU ANNEALING; OXYGEN PARTIAL PRESSURE; SURFACE ENRICHMENT; TIO2; X RAY PHOTOELECTRON SPECTRA;

FILM PREPARATION;

EID: 84908215207     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.5397     Document Type: Article

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