Optoelectronic properties of nanocrystalline tungsten oxide thin films

Proceedings of the IEEE Conference on Nanotechnology

Volumn 2002-January, Issue , 2002, Pages 25-28

  Jayatissa, A H ^a   Cheng, Shih Te ^a  

^a Western Michigan University   (United States)

Author keywords

Annealing; Conductivity; Electrochromism; Optical films; Optical sensors; Optoelectronic and photonic sensors; Optoelectronic devices; Solid state circuits; Transistors; Tungsten

Indexed keywords

AMORPHOUS MATERIALS; ANNEALING; ELECTRIC CONDUCTIVITY; ELECTROCHROMISM; NANOCRYSTALS; NANOSENSORS; NANOTECHNOLOGY; OPTICAL SENSORS; OPTOELECTRONIC DEVICES; OXIDE FILMS; OXIDES; SOLID STATE DEVICES; SOLID-STATE SENSORS; THIN FILMS; TRANSISTORS; TUNGSTEN; TUNGSTEN COMPOUNDS; VACUUM EVAPORATION;

ANNEALING TEMPERATURES; ELECTRICAL CONDUCTIVITY; ELECTRONIC MATERIALS; OPTOELECTRONIC AND PHOTONIC SENSORS; OPTOELECTRONIC PROPERTIES; POLYCRYSTALLINE STRUCTURE; SOLID-STATE CIRCUITS; TUNGSTEN OXIDE THIN FILMS;

OPTICAL FILMS;

EID: 84907803608     PISSN: 19449399     EISSN: 19449380     Source Type: Conference Proceeding    
DOI: 10.1109/NANO.2002.1032115     Document Type: Conference Paper

References (12)

1. J. L. Solis, A. Hoel, V. Lantto, and C. G. Granqvist, "Infrared spectroscopy study of electrochromic nanocrystalline tungsten oxide films made by reactive advanced gas deposition", J.Appl. Phy., vol. 89, pp. 2727-2732, March 2001.
2. 3 Loading, and Calcination Temperature", Ind. Eng. Chem. Res. Vol. 39, pp. 3717-3725, October 2000.
3. M. Di Giulio, "Sputter deposition of tungsten trioxide for gas sensing applications", J. Mat. Sci. : Materials in Electronics, vol. 9, pp. 317-322; August 1998.
4. 3 films", vol, 85, pp. 1540-1544, February 1999.
5. 3 thin film gas sensors", Thin Solid Films, vol. 375, pp. 142-146, January 2000.
6. 3 thin films prepared by sol-gel, thermal evaporation and rf sputtering techniques", Sensors and Actuators, B, vol. 64, pp.182-188, June 2000.
7. 2S sensors", Sensors and Actuators, B, vol. 22, pp.63-68-188, May 1994.
8. 3 films", Electrochimia Acta, vol. 46, pp.1937-1944, November 2000.
9. 3 layers", Thin Solid Films, vol.354, pp. 73-81, July 1999.
10. A. Azens, C. G. Granqvist, E. Pentjuss, J. Gabrusenoks, and J. Barczynska, "Electrochromism of fluorinated and electron-bombarded tungsten oxide films", vol. 78, pp. 1968-1973, August 1995.
11. 4", Electrochemia Acta, vol. 46, pp. 2229-2231, November 2000.
12. J. Tauc, R. Grigorovici and A. Vancu, "Optical properties of amorphous thin films", Phys. Status Solidi, vol.15, pp. 627-634, July 1996.